SCHEMBL793384

SCHEMBL793384

O=C(NCCCCCCNC(=O)OCC1c2ccccc2-c2ccccc21)OCC1c2ccccc2-c2ccccc21

nearest known ligand 0.85

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.85
EPHX2 P34913 1/20 0.54
FABP7 O15540 2/20 0.47
FABP5 Q01469 2/20 0.47
CASP3 P42574 2/20 0.46
TLR2 O60603 1/20 0.45
TLR1 Q15399 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6889085 0.94 KMT2A (0.77) KMT2AEPHX2FABP7FABP5CASP3
SCHEMBL887559 0.94 KMT2A (0.77) KMT2AEPHX2FABP7FABP5CASP3
SCHEMBL29401182 0.94 KMT2A (0.77) KMT2AEPHX2FABP7FABP5CASP3
SCHEMBL29458423 0.94 KMT2A (0.77) KMT2AEPHX2FABP7FABP5CASP3
SCHEMBL1594986 0.93 KMT2A (0.75) KMT2AEPHX2FABP7FABP5CASP3
SCHEMBL15155687 0.93 KMT2A (0.75) KMT2AEPHX2FABP7FABP5CASP3
SCHEMBL6036899 0.93 KMT2A (0.75) KMT2AEPHX2FABP7FABP5CASP3
SCHEMBL15160677 0.93 KMT2A (0.75) KMT2AEPHX2FABP7FABP5CASP3
SCHEMBL15160681 0.93 KMT2A (0.75) KMT2AEPHX2FABP7FABP5CASP3
SCHEMBL16379393 0.93 KMT2A (0.75) KMT2AEPHX2FABP7FABP5CASP3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116096761-A Rubber composition 优迈特株式会社 2023-05-09 CN claimed
CN-116997580-A Ethylene- (meth) acrylate elastomer and method for producing same 优迈特株式会社 2023-11-03 CN disclosed
US-20220009934-A1 NOVEL CARBAMATE ESTER COMPOUND AND ACRYLIC RUBBER COMPOSITION CONTAINING THE SAME UNIMATEC CO., LTD. (JP) 2022-01-13 US disclosed
US-10377879-B2 Chemical amplification in self-strengthening materials THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS (US) 2019-08-13 US disclosed
US-20180105678-A1 CHEMICAL AMPLIFICATION IN SELF-STRENGTHENING MATERIALS THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS (US) 2018-04-19 US disclosed
US-20170226254-A1 CROSS-LINKED RUBBER ZEON CORPORATION (JP) 2017-08-10 US disclosed
EP-2243770-B1 NOVEL DIURETHANE COMPOUND, PROCESS FOR PRODUCING THE SAME, AND ACRYLIC RUBBER COMPOSITION CONTAINING THE SAME UNIMATEC CO LTD (JP) 2015-02-25 EP disclosed
US-8394573-B2 Photoresist compositions and methods for shrinking a photoresist critical dimension INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-03-12 US disclosed
US-8394573-B2 Photoresist compositions and methods for shrinking a photoresist critical dimension INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-03-12 US disclosed
US-8288483-B2 Diurethane compound, process for producing the same, and acrylic rubber composition containing the same UNIMATEC CO., LTD. (JP) 2012-10-16 US disclosed
US-7771915-B2 Two-photon absorbing optical recording material and two-photon absorbing optical recording and reproducing method FUJIFILM CORPORATION (JP) 2010-08-10 US disclosed
US-7771915-B2 Two-photon absorbing optical recording material and two-photon absorbing optical recording and reproducing method FUJIFILM CORPORATION (JP) 2010-08-10 US disclosed
EP-2180467-A1 Photon-mode recording method Fujifilm Corporation (JP) 2010-04-28 EP disclosed
US-7588863-B2 Hologram recording method and hologram recording material FUJIFILM CORPORATION (JP) 2009-09-15 US disclosed
US-7588863-B2 Hologram recording method and hologram recording material FUJIFILM CORPORATION (JP) 2009-09-15 US disclosed
US-7582390-B2 Two-photon absorbing polymerization method, two-photon absorbing optical recording material and two-photon absorbing optical recording method FUJIFILM CORPORATION (JP) 2009-09-01 US disclosed
US-7582390-B2 Two-photon absorbing polymerization method, two-photon absorbing optical recording material and two-photon absorbing optical recording method FUJIFILM CORPORATION (JP) 2009-09-01 US disclosed
WO-2009074522-A1 PHOTORESIST COMPOSITIONS AND METHOD FOR MULTIPLE EXPOSURES WITH MULTIPLE LAYER RESIST SYSTEMS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-06-18 WO disclosed
US-20090155715-A1 PHOTORESIST COMPOSITIONS AND METHOD FOR MULTIPLE EXPOSURES WITH MULTIPLE LAYER RESIST SYSTEMS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-06-18 US disclosed
US-20090155715-A1 PHOTORESIST COMPOSITIONS AND METHOD FOR MULTIPLE EXPOSURES WITH MULTIPLE LAYER RESIST SYSTEMS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-06-18 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20220009934-A1 NOVEL CARBAMATE ESTER COMPOUND AND ACRYLIC RUBBER COMPOSITION CONTAINING THE SAME NCEH1, SUV39H1, CCNH KMT2A 1033/4885EPHX2 368/4885FABP7 4526/4885
US-10377879-B2 Chemical amplification in self-strengthening materials MYB, PARG, ORAI1 KMT2A 473/4885EPHX2 3136/4885FABP7 4311/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.