Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 3/20 | 0.32 |
| ▸ | CA2 | P00918 | 3/20 | 0.32 |
| ▸ | CA12 | O43570 | 2/20 | 0.32 |
| ▸ | CA9 | Q16790 | 2/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL51373 | 0.97 | CA1 (0.36) | CA1CA2CA12CA9 | |
| SCHEMBL29212225 | 0.97 | CA1 (0.36) | CA1CA2CA12CA9 | |
| SCHEMBL29212226 | 0.97 | CA1 (0.36) | CA1CA2CA12CA9 | |
| SCHEMBL3673090 | 0.97 | CA1 (0.36) | CA1CA2CA12CA9 | |
| SCHEMBL833964 | 0.85 | — | — | |
| SCHEMBL3898721 | 0.82 | — | — | |
| SCHEMBL13203294 | 0.80 | ALDH1A1 (0.42) | — | |
| SCHEMBL9861657 | 0.80 | ACHE (0.31) | CA1CA2CA12CA9 | |
| SCHEMBL17014988 | 0.76 | CA1 (0.36) | CA1CA2CA12CA9 | |
| SCHEMBL3889052 | 0.76 | CA1 (0.42) | CA1CA2CA12CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11733609-B2 | Silicon-containing underlayers | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2023-08-22 | — | — | US | disclosed |
| US-11542397-B2 | Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display device | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-01-03 | — | — | US | disclosed |
| US-20220389308-A1 | WAVELENGTH CONVERSION FILM, WAVELENGTH CONVERSION FILM FORMING COMPOSITION, AND CLUSTER-CONTAINING QUANTUM DOT PRODUCTION METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-12-08 | — | — | US | disclosed |
| US-11413682-B2 | Method for producing surface-modified metal oxide fine particle, method for producing improved metal oxide fine particles, surface-modified metal oxide fine particles, and metal oxide fine particle dispersion liquid | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-08-16 | — | — | US | disclosed |
| US-11360387-B2 | Silicon-containing underlayers | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2022-06-14 | — | — | US | disclosed |
| EP-3998324-A1 | WAVELENGTH CONVERSION FILM, WAVELENGTH CONVERSION FILM FORMING COMPOSITION, AND CLUSTER-CONTAINING QUANTUM DOT PRODUCTION METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-05-18 | — | — | EP | disclosed |
| US-20220073817-A1 | METHOD FOR PRODUCING QUANTUM DOT-CONTAINING FILM AND COMPOSITION FOR PRODUCING QUANTUM DOT-CONTAINING FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-03-10 | — | — | US | disclosed |
| CN-114127228-A | Wavelength conversion film, composition for forming wavelength conversion film, and method for producing cluster-containing quantum dot | 东京应化工业株式会社 | 2022-03-01 | — | — | CN | disclosed |
| CN-108250754-B | Silicon-containing resin composition, silicon-containing resin film, silica film, light-emitting display element panel, and light-emitting display device | 东京应化工业株式会社 | 2022-01-25 | — | — | CN | disclosed |
| US-20210397093-A1 | SILICON-CONTAINING UNDERLAYERS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2021-12-23 | — | — | US | disclosed |
| US-9627204-B2 | Composition for forming a coating type BPSG film, substrate formed a film by said composition, and patterning process using said composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-18 | — | — | US | disclosed |
| US-9580623-B2 | Patterning process using a boron phosphorus silicon glass film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-02-28 | — | — | US | disclosed |
| US-20160276152-A1 | PATTERNING PROCESS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2016-09-22 | — | — | US | disclosed |
| US-20160096978-A1 | COMPOSITION FOR FORMING A COATING TYPE BPSG FILM, SUBSTRATE, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-07 | — | — | US | disclosed |
| US-20160096977-A1 | COMPOSITION FOR FORMING A COATING TYPE SILICON-CONTAINING FILM, SUBSTRATE, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-07 | — | — | US | disclosed |
| EP-2826826-A1 | Composition for forming a coating type BPSG film, substrate formed a film by said composition, and patterning process using said composition | Shin-Etsu Chemical Co., Ltd. (JP) | 2015-01-21 | — | — | EP | disclosed |
| US-20150004791-A1 | COMPOSITION FOR FORMING A COATING TYPE BPSG FILM, SUBSTRATE FORMED A FILM BY SAID COMPOSITION, AND PATTERNING PROCESS USING SAID COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-01-01 | — | — | US | disclosed |
| US-6248265-B1 | Clean generation of a fluoroaryl grignard reagent | ALBEMARLE CORPORATION | 2001-06-19 | — | — | US | disclosed |
| US-5382617-A | Heat resistant polymers with boron oxide | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1995-01-17 | — | — | US | disclosed |
| US-4092465-A | PRESSURE SENSITIVE, IMPROVED CREEP RESISTANCE | PHILLIPS PETROLEUM COMPANY (US) | 1978-05-30 | — | — | US | disclosed |