SCHEMBL7949744

SCHEMBL7949744

FN(C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.36

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.36
THRB P10828 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17092890 1.00 LMNA (0.36) LMNATHRB
SCHEMBL28581071 1.00 LMNA (0.36) LMNATHRB
SCHEMBL9636964 0.97 LMNA (0.32) LMNA
SCHEMBL9903892 0.94 LMNA (0.40) LMNATHRB
SCHEMBL345872 0.94 LMNA (0.40) LMNATHRB
SCHEMBL9903342 0.91 LMNA (0.38) LMNATHRB
SCHEMBL3657606 0.91 LMNA (0.38) LMNATHRB
SCHEMBL9686592 0.91 LMNA (0.38) LMNATHRB
SCHEMBL5453225 0.91 LMNA (0.35) LMNA
Hydrochloric Acid SCHEMBL3297398 0.88 LMNA (0.36) LMNATHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122037822-A Modified starch-based aqueous adhesive and preparation method and application thereof 肇庆市华莱特复合新型材料有限公司 2026-05-15 CN claimed
CN-122037822-A Modified starch-based aqueous adhesive and preparation method and application thereof 肇庆市华莱特复合新型材料有限公司 2026-05-15 CN disclosed
CN-113574422-A Optical element and method for manufacturing the same 松下知识产权经营株式会社 2021-10-29 CN disclosed
US-10077365-B2 Liquid chemical for forming water repellent protecting film, and process for cleaning wafers using the same CENTRAL GLASS COMPANY, LIMITED (JP) 2018-09-18 US disclosed
US-20160230016-A1 Liquid Chemical for Forming Water Repellent Protecting Film, and Process for Cleaning Wafers Using the Same CENTRAL GLASS COMPANY, LIMITED (JP) 2016-08-11 US disclosed
US-9349582-B2 Liquid chemical for forming water repellent protecting film, and process for cleaning wafers using the same CENTRAL GLASS COMPANY, LIMITED (JP) 2016-05-24 US disclosed
US-20150270123-A1 Liquid Chemical for Forming Protective Film CENTRAL GLASS COMPANY, LIMITED (JP) 2015-09-24 US disclosed
US-20120272999-A1 Liquid Chemical for Forming Water Repellent Protecting Film, and Process for Cleaning Wafers Using the Same CENTRAL GLASS COMPANY, LIMITED (JP) 2012-11-01 US disclosed
US-6254644-B1 LOW-METAL SALT TANNING WITH A REACTIVE ORGANIC TANNING AGENT, ALDEHYDES OR BISULPHITE-BLOCKED POLYISOCYANATES, AND RETANNING WITH POLYASPARTIC ACID AND/OR POLYASPARTAMIDES, FINISH OF POLYURETHANE AND/OR POLYESTERAMIDE BAYER AKTIENGESELLSCHAFT (DE) 2001-07-03 US disclosed
US-5885474-A TREATING LEATHER WITH MODIFIED POLYSUCCINIMIDE AND FIXING THE LEATHER BY ADDITION OF CHROMIUM, ALUMINUM, ZIRCONIUM OR TITANIUM COMPOUNDS BAYER AKTIENGESELLSCHAFT (DE) 1999-03-23 US disclosed
EP-0376801-B1 POLYFLUOROALKYL-SUBSTITUTED ACETATES, THIOACETATES AND ACETAMIDES, THEIR PREPARATION AND USES ELF ATOCHEM S.A. (FR) 1992-07-01 EP disclosed
EP-0376801-A2 Polyfluoroalkyl-substituted acetates, thioacetates and acetamides, their preparation and uses ELF ATOCHEM S.A. (FR) 1990-07-04 EP disclosed