Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PKM | P14618 | 6/20 | 0.50 |
| ▸ | PKLR | P30613 | 2/20 | 0.50 |
| ▸ | CES2 | O00748 | 3/20 | 0.44 |
| ▸ | CES1 | P23141 | 3/20 | 0.44 |
| ▸ | TSHR | P16473 | 2/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.40 |
| ▸ | BCHE | P06276 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.37 |
| ▸ | ALB | P02768 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | ERN1 | O75460 | 1/20 | 0.37 |
| ▸ | IKBKB | O14920 | 1/20 | 0.36 |
| ▸ | SLC40A1 | Q9NP59 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL28046996 | 0.97 | PKM (0.48) | PKMPKLRCES2CES1TSHR | |
| SCHEMBL3926685 | 0.97 | PKM (0.48) | PKMPKLRCES2CES1TSHR | |
| SCHEMBL152363 | 0.88 | PKM (0.45) | PKMPKLRCES2CES1TSHR | |
| SCHEMBL28811247 | 0.86 | PKM (0.44) | PKMPKLRCES2CES1TSHR | |
| SCHEMBL10296112 | 0.84 | PKM (0.47) | PKMPKLRCES2CES1SMN1; SMN2 | |
| SCHEMBL7708264 | 0.84 | ACHE (0.44) | PKMPKLRCES2CES1TSHR | |
| SCHEMBL14102497 | 0.84 | PKM (0.42) | PKMPKLRCES2CES1TSHR | |
| SCHEMBL8412762 | 0.83 | ACHE (0.43) | PKMPKLRCES2CES1TSHR | |
| SCHEMBL3197747 | 0.81 | SLC22A12 (0.42) | PKMPKLRCES2CES1 | |
| SCHEMBL576596 | 0.81 | ALB (0.55) | PKMPKLRCES2CES1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 75 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20050158657-A1 | Radiation-sensitive resin composition | SUZUKI AKI (JP) | 2005-07-21 | — | — | US | claimed |
| US-6899989-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-05-31 | — | — | US | claimed |
| US-20020090569-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-07-11 | — | — | US | claimed |
| EP-3306732-B1 | NONAQUEOUS ELECTROLYTE SOLUTION FOR BATTERIES AND LITHIUM SECONDARY BATTERY | MITSUI CHEMICALS INC (JP) | 2025-06-25 | — | — | EP | disclosed |
| US-20250020997-A1 | PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-01-16 | — | — | US | disclosed |
| US-20230176481-A1 | FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2023-06-08 | — | — | US | disclosed |
| CN-107889541-A | Nonaqueous electrolyte for battery and lithium secondary battery | 三井化学株式会社 | 2018-04-06 | — | — | CN | disclosed |
| CN-107534185-A | Nonaqueous electrolyte for battery and lithium secondary battery | 三井化学株式会社 | 2018-01-02 | — | — | CN | disclosed |
| US-20170346127-A1 | LITHIUM SECONDARY BATTERY | MITSUI CHEMICALS, INC. (JP) | 2017-11-30 | — | — | US | disclosed |
| EP-3211706-A1 | LITHIUM SECONDARY BATTERY | Mitsui Chemicals, Inc. (JP) | 2017-08-30 | — | — | EP | disclosed |
| CN-107078338-A | Lithium secondary battery | 三井化学株式会社 | 2017-08-18 | — | — | CN | disclosed |
| EP-1377580-A2 | BENZENESULFONIC ACID INDOL-5-YL ESTERS AS ANTAGONISTS OF THE 5-HT6 RECEPTOR | ELI LILLY AND COMPANY (US) | 2004-01-07 | — | — | EP | disclosed |
| US-20030235779-A1 | Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-12-25 | — | — | US | disclosed |
| US-20030207201-A1 | Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-11-06 | — | — | US | disclosed |
| US-20030113659-A1 | Resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-06-19 | — | — | US | disclosed |
| WO-2002060871-A2 | BENZENESULFONIC ACID INDOL-5-YL ESTERS AS ANTAGONISTS OF THE 5-HT6 RECEPTOR | ELI LILLY AND COMPANY (US) | 2002-08-08 | — | — | WO | disclosed |
| US-20020090569-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-07-11 | — | — | US | disclosed |
| EP-0385874-A1 | Functionalisation at position (n+1) of aryl derivatives disubstituted at position n and (n+2) | RHONE-POULENC CHIMIE (FR) | 1990-09-05 | — | — | EP | disclosed |
| EP-0224292-B1 | PROCESS FOR THE PREPARATION OF ORGANIC ISOCYANATES | SHELL INTERNATIONALE RESEARCHMAATSCHAPPIJ B.V. (NL) | 1990-04-11 | — | — | EP | disclosed |
| EP-0224292-A1 | Process for the preparation of organic isocyanates | SHELL INTERNATIONALE RESEARCHMAATSCHAPPIJ B.V. (NL) | 1987-06-03 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170346127-A1 | LITHIUM SECONDARY BATTERY | SLC9B2, SCN11A, NUCB2 | PKM 3321/4885PKLR 3351/4885CES2 727/4885 |
| US-20030207201-A1 | Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method | ASIC1, PARG, EEF1A2 | PKM 3043/4885PKLR 1543/4885CES2 3936/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.