SCHEMBL7962539

SCHEMBL7962539

COc1ncc2[c]cccc2n1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PDPK1 O15530 1/20 0.36
POLB P06746 1/20 0.35
CYP1A2 P05177 13/20 0.34
CYP3A4 P08684 7/20 0.34
CYP2C19 P33261 7/20 0.34
ALDH1A1 P00352 7/20 0.34
HSD17B10 Q99714 3/20 0.34
TSHR P16473 6/20 0.33
MAPK1 P28482 2/20 0.33
ALOX15 P16050 1/20 0.33
KDM4E B2RXH2 1/20 0.33
USP2 O75604 4/20 0.32
CLK4 Q9HAZ1 3/20 0.32
CYP2C9 P11712 3/20 0.32
CYP2D6 P10635 2/20 0.32
NPC1 O15118 1/20 0.32
HTT P42858 1/20 0.32
RAB9A P51151 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
RXFP1 Q9HBX9 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1260006 0.77 LMNA (0.36) CYP1A2TSHRMAPK1KDM4EHTT
SCHEMBL7976143 0.74 HASPIN (0.34) PDPK1CYP1A2CYP3A4CYP2C19ALDH1A1
SCHEMBL12471686 0.73 DCPS (0.38) PDPK1POLBCYP1A2ALDH1A1HSD17B10
SCHEMBL1261600 0.72 KDM4E (0.32) ALDH1A1TSHRKDM4ENPSR1RXFP1
SCHEMBL30824482 0.72 KDM4E (0.46) PDPK1POLBCYP1A2CYP3A4CYP2C19
SCHEMBL382006 0.72 KDM4E (0.46) PDPK1POLBCYP1A2CYP3A4CYP2C19
SCHEMBL20265014 0.71 KDM4E (0.39) PDPK1POLBCYP1A2ALDH1A1KDM4E
Hydrochloric Acid SCHEMBL28102802 0.71 KDM4E (0.44) PDPK1POLBCYP1A2CYP3A4CYP2C19
Hydrochloric Acid SCHEMBL28174209 0.71 KDM4E (0.44) PDPK1POLBCYP1A2CYP3A4CYP2C19
SCHEMBL30231551 0.69 PDGFRB (0.46) POLBCYP1A2CYP3A4CYP2C19ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6268514-B1 TREATING INDUSTRIAL MATERIALS WITH NITROETHANE COMPOUND FOR PROTECTING AGAINST ATTACK AND DESTRUCTION BY MICROORGANISMS BASF AKTIENGESELLSCHAFT (DE) 2001-07-31 US disclosed