SCHEMBL7962895

SCHEMBL7962895

CCN(CC)c1ccc(C=Nc2ccc(O)cc2C)cc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 15/20 0.57
MAPT P10636 13/20 0.57
RAB9A P51151 5/20 0.57
KDM4E B2RXH2 6/20 0.54
GAA P10253 5/20 0.54
NPC1 O15118 3/20 0.52
MEN1 O00255 4/20 0.49
KMT2A Q03164 4/20 0.49
HPGD P15428 3/20 0.49
CASP1 P29466 3/20 0.49
HSD17B10 Q99714 2/20 0.49
CYP3A4 P08684 2/20 0.49
TP53 P04637 1/20 0.49
ALOX15 P16050 1/20 0.49
TSHR P16473 1/20 0.49
ESRRG P62508 1/20 0.49
HDAC6 Q9UBN7 1/20 0.49
SMN1; SMN2 Q16637 1/20 0.48
G6PD P11413 1/20 0.46
LMNA P02545 3/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7962892 1.00 ALDH1A1 (0.57) ALDH1A1MAPTRAB9AKDM4EGAA
SCHEMBL7962873 0.89 ALDH1A1 (0.54) ALDH1A1MAPTRAB9AKDM4EGAA
SCHEMBL7962875 0.89 ALDH1A1 (0.54) ALDH1A1MAPTRAB9AKDM4EGAA
SCHEMBL21470897 0.86 RORC (0.51) ALDH1A1MAPTRAB9AKDM4EGAA
SCHEMBL11313027 0.85 RORC (0.50) ALDH1A1MAPTRAB9AKDM4EGAA
SCHEMBL11313022 0.85 RORC (0.50) ALDH1A1MAPTRAB9AKDM4EGAA
SCHEMBL3437483 0.80 ALDH1A1 (0.52) ALDH1A1MAPTRAB9AKDM4EGAA
SCHEMBL6331192 0.79 ALDH1A1 (0.54) ALDH1A1MAPTRAB9AKDM4EGAA
SCHEMBL7262235 0.79 ALDH1A1 (0.54) ALDH1A1MAPTRAB9AKDM4EGAA
SCHEMBL7962900 0.79 ALDH1A1 (0.60) ALDH1A1MAPTKDM4EGAAMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6268108-B1 MIXTURE OF COMPOUND FORMING ACID UPON EXPOSURE OF ACTINIC RADIATION, COMPOUND CAPABLE OF CROSSLINKING, DYE AND SOLVENT TOKYO OHKA KOGYO CO., LTD. (JP) 2001-07-31 US disclosed
US-6071673-A Method for the formation of resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2000-06-06 US disclosed