SCHEMBL7962873

SCHEMBL7962873

CCN(CC)c1ccc(/C=N/c2ccc(O)cc2O)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 14/20 0.54
KDM4E B2RXH2 6/20 0.54
GAA P10253 6/20 0.54
MAPT P10636 11/20 0.49
KMT2A Q03164 6/20 0.49
MEN1 O00255 5/20 0.49
HPGD P15428 2/20 0.49
CASP1 P29466 2/20 0.49
CYP3A4 P08684 2/20 0.49
ESRRG P62508 2/20 0.49
TP53 P04637 1/20 0.49
ALOX15 P16050 1/20 0.49
TSHR P16473 1/20 0.49
HSD17B10 Q99714 1/20 0.49
HDAC6 Q9UBN7 1/20 0.49
RAB9A P51151 4/20 0.48
LMNA P02545 2/20 0.48
TDP1 Q9NUW8 2/20 0.48
CRHBP P24387 1/20 0.48
CRHR2 Q13324 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7962875 1.00 ALDH1A1 (0.54) ALDH1A1KDM4EGAAMAPTKMT2A
SCHEMBL7962892 0.89 ALDH1A1 (0.57) ALDH1A1KDM4EGAAMAPTKMT2A
SCHEMBL7962895 0.89 ALDH1A1 (0.57) ALDH1A1KDM4EGAAMAPTKMT2A
SCHEMBL7974522 0.82 ALDH1A1 (0.57) ALDH1A1KDM4EGAAMAPTKMT2A
SCHEMBL7974520 0.82 ALDH1A1 (0.57) ALDH1A1KDM4EGAAMAPTKMT2A
SCHEMBL11314011 0.79 ALDH1A1 (0.60) ALDH1A1KDM4EGAAMAPTKMT2A
SCHEMBL7962899 0.79 ALDH1A1 (0.60) ALDH1A1KDM4EGAAMAPTKMT2A
SCHEMBL7962900 0.79 ALDH1A1 (0.60) ALDH1A1KDM4EGAAMAPTKMT2A
SCHEMBL11314008 0.79 ALDH1A1 (0.60) ALDH1A1KDM4EGAAMAPTKMT2A
SCHEMBL7979228 0.78 ALDH1A1 (0.51) ALDH1A1KDM4EGAAMAPTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6268108-B1 MIXTURE OF COMPOUND FORMING ACID UPON EXPOSURE OF ACTINIC RADIATION, COMPOUND CAPABLE OF CROSSLINKING, DYE AND SOLVENT TOKYO OHKA KOGYO CO., LTD. (JP) 2001-07-31 US disclosed
US-6071673-A Method for the formation of resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2000-06-06 US disclosed