SCHEMBL7964980

SCHEMBL7964980

O=C1C2C3C=CC(C3)C2C(=O)N1OS(=O)(=O)C(C(F)(F)F)(C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.37

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.37
TDP1 Q9NUW8 1/20 0.37
MEN1 O00255 2/20 0.34
KMT2A Q03164 2/20 0.34
RAB9A P51151 2/20 0.34
SMN1; SMN2 Q16637 4/20 0.33
HTT P42858 3/20 0.33
LMNA P02545 1/20 0.33
RECQL P46063 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
USP2 O75604 2/20 0.32
TSHR P16473 2/20 0.32
HSD17B10 Q99714 1/20 0.32
PKM P14618 1/20 0.32
MAPK1 P28482 1/20 0.31
KDM4E B2RXH2 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL548177 0.88 ALDH1A1 (0.38) ALDH1A1TDP1MEN1KMT2ARAB9A
SCHEMBL52182 0.86 ALDH1A1 (0.39) ALDH1A1TDP1MEN1KMT2ARAB9A
SCHEMBL107102 0.83 ALDH1A1 (0.46) ALDH1A1TDP1MEN1KMT2ARAB9A
SCHEMBL14564324 0.83 ALDH1A1 (0.46) ALDH1A1TDP1MEN1KMT2ARAB9A
SCHEMBL14448181 0.83 ALDH1A1 (0.46) ALDH1A1TDP1MEN1KMT2ARAB9A
SCHEMBL14491491 0.83 ALDH1A1 (0.46) ALDH1A1TDP1MEN1KMT2ARAB9A
SCHEMBL13098332 0.76 ALDH1A1 (0.37) ALDH1A1TDP1MEN1KMT2ARAB9A
SCHEMBL14983970 0.76 ALDH1A1 (0.40) ALDH1A1TDP1MEN1KMT2ARAB9A
SCHEMBL14983976 0.76 ALDH1A1 (0.42) ALDH1A1TDP1MEN1KMT2ARAB9A
SCHEMBL20176706 0.74 POLB (0.44) ALDH1A1TDP1KMT2ASMN1; SMN2RECQL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6261743-B1 APPLYING ON A SUBSTRATE A LAYER OF AN ANTIREFLECTIVE COMPOSITION COMPRISED OF PHOTOACID GENERATOR COMPOUND, ACID OR THERMAL ACID GENERATOR COMPOUND, & CROSSLINKER, THEN DEVELOPING THE EXPOSED PHOTORESIST SHIPLEY COMPANY, L.L.C. 2001-07-17 US disclosed