Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
| ▸ | CA2 | P00918 | 3/20 | 0.37 |
| ▸ | MEN1 | O00255 | 2/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
| ▸ | RAB9A | P51151 | 2/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.34 |
| ▸ | HTT | P42858 | 3/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | RECQL | P46063 | 1/20 | 0.34 |
| ▸ | CA1 | P00915 | 2/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | USP2 | O75604 | 2/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | PKM | P14618 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL52182 | 0.99 | ALDH1A1 (0.39) | ALDH1A1TDP1CA2MEN1KMT2A | |
| SCHEMBL7964980 | 0.88 | ALDH1A1 (0.37) | ALDH1A1TDP1MEN1KMT2ARAB9A | |
| SCHEMBL4837339 | 0.85 | CA2 (0.41) | CA2CA1 | |
| SCHEMBL4834833 | 0.85 | CA2 (0.36) | ALDH1A1CA2CA1 | |
| SCHEMBL14491491 | 0.84 | ALDH1A1 (0.46) | ALDH1A1TDP1MEN1KMT2ARAB9A | |
| SCHEMBL107102 | 0.84 | ALDH1A1 (0.46) | ALDH1A1TDP1MEN1KMT2ARAB9A | |
| SCHEMBL14448181 | 0.84 | ALDH1A1 (0.46) | ALDH1A1TDP1MEN1KMT2ARAB9A | |
| SCHEMBL14564324 | 0.84 | ALDH1A1 (0.46) | ALDH1A1TDP1MEN1KMT2ARAB9A | |
| SCHEMBL4835348 | 0.84 | CA2 (0.38) | CA2CA1 | |
| SCHEMBL4835123 | 0.83 | CA2 (0.34) | ALDH1A1CA2CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 430 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2297613-B1 | ORTHOGONAL PROCESSING OF ORGANIC MATERIALS USED IN ELECTRONIC AND ELECTRICAL DEVICES | UNIV CORNELL (US) | 2017-11-29 | — | — | EP | claimed |
| US-8846301-B2 | Orthogonal processing of organic materials used in electronic and electrical devices | CORNELL UNIVERSITY (US) | 2014-09-30 | — | — | US | claimed |
| US-20110159252-A1 | Orthogonal Procesing of Organic Materials Used in Electronic and Electrical Devices | NATIONAL SCIENCE FOUNDATION | 2011-06-30 | — | — | US | claimed |
| EP-2297613-A2 | ORTHOGONAL PROCESSING OF ORGANIC MATERIALS USED IN ELECTRONIC AND ELECTRICAL DEVICES | Cornell University (US) | 2011-03-23 | — | — | EP | claimed |
| WO-2009143357-A2 | ORTHOGONAL PROCESSING OF ORGANIC MATERIALS USED IN ELECTRONIC AND ELECTRICAL DEVICES | CORNELL UNIVERSITY (US) | 2009-11-26 | — | — | WO | claimed |
| US-12393115-B2 | Positive working photosensitive material | MERCK PATENT GMBH (DE) | 2025-08-19 | — | — | US | disclosed |
| WO-2024176973-A1 | METHOD FOR PRODUCING PURIFIED RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND PURIFIED RESIST COMPOSITION | 東京応化工業株式会社 | 2024-08-29 | — | — | WO | disclosed |
| US-20240231231-A1 | METHOD FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE, COMPOSITION, AND RESIST UNDERLAYER FILM | JSR CORPORATION (JP) | 2024-07-11 | — | — | US | disclosed |
| US-20230096312-A1 | RESIST COMPOSITION AND METHOD FOR USING RESIST COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-03-30 | — | — | US | disclosed |
| WO-2023021971-A1 | METHOD FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE, COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND RESIST UNDERLAYER FILM, | JSR株式会社 | 2023-02-23 | — | — | WO | disclosed |
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-02-07 | — | — | US | disclosed |
| WO-2023008354-A1 | RESIST COMPOSITION AND RESIST FILM FORMING METHOD USING SAME | 三菱瓦斯化学株式会社 | 2023-02-02 | — | — | WO | disclosed |
| EP-1008913-A1 | Photoresist compositions comprising itaconic anhydride polymers | Shipley Company LLC (US) | 2000-06-14 | — | — | EP | disclosed |
| US-6048672-A | RELIEF IMAGES ON SUBSTRATES WITH TITANIUM NITRIDE SURFACES, HEATING, COATING, EXPOSURE AND DEVELOPMENT | SHIPLEY COMPANY, L.L.C. (US) | 2000-04-11 | — | — | US | disclosed |
| EP-0985974-A1 | Photoresist compositions comprising blends of ionic and non-ionic photoacid generators | Shipley Company LLC (US) | 2000-03-15 | — | — | EP | disclosed |
| US-6037107-A | EXPOSING TO ACTIVATION RADIATION A POSITIVE WORKING PHOTORESIST COMPRISING AN ALKALI SOLUBLE RESIN SUBSTITUTED WITH AN ACID LABILE BLOCKING GROUP TO GENERATE HALOGENATED SULFONIC ACID BY PHOTOLYSIS | SHIPLEY COMPANY, L.L.C. (US) | 2000-03-14 | — | — | US | disclosed |
| US-5976770-A | Dyed photoresists and methods and articles of manufacture comprising same | SHIPLEY COMPANY, L.L.C. (US) | 1999-11-02 | — | — | US | disclosed |
| EP-0938029-A2 | Methods using photoresist compositions and articles produced therewith | Shipley Company LLC (US) | 1999-08-25 | — | — | EP | disclosed |
| EP-0930542-A1 | Polymers and photoresist compositions for short wavelength imaging | Shipley Company LLC (US) | 1999-07-21 | — | — | EP | disclosed |
| US-5876899-A | POLYMERIZATION OF ACRYLIC MONOMERS IN ETHYL LACTATE | SHIPLEY COMPANY, L.L.C. (US) | 1999-03-02 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110159252-A1 | Orthogonal Procesing of Organic Materials Used in Electronic and Electrical Devices | FRG1, RARG, NPM1 | ALDH1A1 2340/4885TDP1 2344/4885CA2 1826/4885 |
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | C9, C5, C1R | ALDH1A1 1540/4885TDP1 3114/4885CA2 1466/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.