⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11785129 | 0.87 | KDM4E (0.33) | — | |
| SCHEMBL483236 | 0.82 | HSP90AB1 (0.41) | — | |
| SCHEMBL82113 | 0.69 | MEN1 (0.35) | — | |
| SCHEMBL10271824 | 0.69 | — | — | |
| SCHEMBL9849724 | 0.65 | ALDH1A1 (0.30) | — | |
| SCHEMBL1976536 | 0.62 | KDM4E (0.33) | — | |
| SCHEMBL8709336 | 0.62 | — | — | |
| SCHEMBL13721848 | 0.62 | — | — | |
| SCHEMBL4932101 | 0.62 | — | — | |
| SCHEMBL92460 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1112 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230350293-A1 | I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR REDUCING HEIGHT DIFFERENCE BETWEEN CENTER AND EDGE AND REDUCING LER, AND I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR IMPROVING PROCESS MARGIN | YOUNG CHANG CHEMICAL CO., LTD (KR) | 2023-11-02 | — | — | US | claimed |
| EP-4220301-A1 | I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR REDUCING HEIGHT DIFFERENCE BETWEEN CENTER AND EDGE AND REDUCING LER, AND I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR IMPROVING PROCESS MARGIN | Young Chang Chemical Co., Ltd. (KR) | 2023-08-02 | — | — | EP | claimed |
| US-11697744-B2 | High impact strength 3D printing materials derived from polycycloolefin monomers and crosslinkers | PROMERUS, LLC (US) | 2023-07-11 | — | — | US | claimed |
| CN-112335252-B | Polycycloolefin monomer as 3D printing material and catalyst activated by compound capable of generating photoacid | 住友电木株式会社 | 2023-07-04 | — | — | CN | claimed |
| CN-116194842-A | Negative photoresist composition for I-line for improving step difference and LER between center and edge, and negative photoresist composition for I-line for improving process margin | 荣昌化学制品株式会社 | 2023-05-30 | — | — | CN | claimed |
| WO-2022065713-A1 | I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR REDUCING HEIGHT DIFFERENCE BETWEEN CENTER AND EDGE AND REDUCING LER, AND I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR IMPROVING PROCESS MARGIN | 영창케미칼 주식회사 | 2022-03-31 | — | — | WO | claimed |
| US-20220010157-A1 | HIGH IMPACT STRENGTH 3D PRINTING MATERIALS DERIVED FROM POLYCYCLOOLEFIN MONOMERS AND CROSSLINKERS | PROMERUS, LLC (US) | 2022-01-13 | — | — | US | claimed |
| WO-2020132665-A1 | HIGH IMPACT STRENGTH 3D PRINTING MATERIALS DERIVED FROM POLYCYCOOLEFIN MONOMERS AND CROSSLINKERS | PROMERUS, LLC (US) | 2020-06-25 | — | — | WO | claimed |
| US-20180246404-A1 | I-LINE NEGATIVE TYPE PHOTORESIST COMPOSITION HAVING EXCELLENT ETCHING RESISTANCE | YCCHEM CO., LTD. (KR) | 2018-08-30 | — | — | US | claimed |
| US-4359524-A | ANTIHALATION LAYER OF HALOGEN COMPOUND AND MEROCYANIN DYE | FUJI PHOTO FILM CO., LTD. (JP) | 1982-11-16 | — | — | US | claimed |
| US-4318977-A | PHTHALALDEHYDE REDUCING AGENTS AND S-TRIAZINE OXIDIZEWRS | EASTMAN KODAK COMPANY (US) | 1982-03-09 | — | — | US | claimed |
| US-4292399-A | Cobalt (III) complex imaging compositions having improved photographic properties | EASTMAN KODAK COMPANY (US) | 1981-09-29 | — | — | US | claimed |
| US-4239850-A | PHOTOINITIATOR OF AN UNSATURATED KETONE AND A TRIHALOMETHYL TRIAZINE | FUJI PHOTO FILM CO., LTD. (JP) | 1980-12-16 | — | — | US | claimed |
| JP-57068831-A | — | — | None | — | — | JP | disclosed |
| US-12622847-B2 | Organosilicon compound and dental composition containing same | KURARAY NORITAKE DENTAL INC. (JP) | 2026-05-12 | — | — | US | disclosed |
| US-20260060900-A1 | DENTAL COMPOSITE RESIN KIT | SHOFU INC. (JP) | 2026-03-05 | — | — | US | disclosed |
| US-4258123-A | UNSATURATED COMPOUND, HALOGENATED TRIAZINE, UNSATURATED KETONE | FUJI PHOTO FILM CO., LTD. (JP) | 1981-03-24 | — | — | US | disclosed |
| US-4239850-A | PHOTOINITIATOR OF AN UNSATURATED KETONE AND A TRIHALOMETHYL TRIAZINE | FUJI PHOTO FILM CO., LTD. (JP) | 1980-12-16 | — | — | US | disclosed |
| US-3987037-A | RADIATION-SENSITIVE FREE RADICAL GENERATORS | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1976-10-19 | — | — | US | disclosed |
| US-3954475-A | Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1976-05-04 | — | — | US | disclosed |