Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | PKM | P14618 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11733090 | 0.94 | CASP1 (0.33) | KDM4ELMNAPKM | |
| SCHEMBL9076886 | 0.94 | CASP1 (0.33) | KDM4ELMNAPKM | |
| SCHEMBL9151003 | 0.87 | TSHR (0.39) | KDM4ELMNA | |
| SCHEMBL79695 | 0.83 | CCNB2 (0.31) | KDM4E | |
| SCHEMBL10709901 | 0.82 | HSP90AB1 (0.41) | KDM4ELMNAPKM | |
| SCHEMBL10713503 | 0.78 | NPC1 (0.40) | KDM4ELMNAPKM | |
| SCHEMBL9350626 | 0.77 | HSP90AB1 (0.52) | — | |
| SCHEMBL7563558 | 0.77 | — | — | |
| SCHEMBL10602143 | 0.75 | PDE10A (0.39) | — | |
| SCHEMBL7554477 | 0.72 | PDE10A (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 129 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12416860-B2 | Photoresist film and application thereof | CHANG CHUN PLASTICS CO., LTD. (TW) | 2025-09-16 | — | — | US | disclosed |
| US-20250224674-A1 | PHOTOSENSITIVE RESIN FILM AND APPLICATION THEREOF | CHANG CHUN PLASTICS CO., LTD. (TW) | 2025-07-10 | — | — | US | disclosed |
| US-20250076763-A1 | PHOTOSENSITIVE RESIN LAMINATE AND APPLICATION THEREOF | CHANG CHUN PLASTICS CO., LTD. (TW) | 2025-03-06 | — | — | US | disclosed |
| CN-119556523-A | Photosensitive resin laminate and use thereof | 长春人造树脂厂股份有限公司 | 2025-03-04 | — | — | CN | disclosed |
| CN-117631439-A | Photoresist film and application thereof | 长春人造树脂厂股份有限公司 | 2024-03-01 | — | — | CN | disclosed |
| US-20240069440-A1 | PHOTORESIST FILM AND APPLICATION THEREOF | CHANG CHUN PLASTICS CO., LTD. (TW) | 2024-02-29 | — | — | US | disclosed |
| CN-110032042-B | Negative photoresist composition for laser ablation and method of use thereof | 默克专利有限公司 | 2022-05-27 | — | — | CN | disclosed |
| EP-2016464-B1 | NEGATIVE PHOTORESIST COMPOSITIONS | MERCK PATENT GMBH (DE) | 2021-04-28 | — | — | EP | disclosed |
| EP-3394674-B1 | NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND PROCESSES USING THEM | AZ ELECTRONIC MAT LUXEMBOURG SARL (LU) | 2020-05-06 | — | — | EP | disclosed |
| EP-3511774-A1 | NEGATIVE-WORKING PHOTORESIST COMPOSITION FOR LASER ABLATION AND PROCESS USING IT | AZ Electronic Materials Luxembourg S.à.r.l. (LU) | 2019-07-17 | — | — | EP | disclosed |
| US-5091280-A | Photothermography; microencapsulated leuco dyes, polymerizable vinyl monomer, photoinitiator electron acceptive developer | FUJI PHOTO FILM CO., LTD. (JP) | 1992-02-25 | — | — | US | disclosed |
| EP-0461651-A1 | Recording medium | FUJI PHOTO FILM CO., LTD. (JP) | 1991-12-18 | — | — | EP | disclosed |
| EP-0441524-A2 | Polymers containing halomethyl-1,3,5-triazine moieties | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1991-08-14 | — | — | EP | disclosed |
| EP-0422686-A2 | Aluminate complex and use thereof in photopolymerizable composition and image-forming material | FUJI PHOTO FILM CO., LTD. (JP) | 1991-04-17 | — | — | EP | disclosed |
| EP-0412570-A2 | Light- and heat-sensitive recording material | FUJI PHOTO FILM CO., LTD. (JP) | 1991-02-13 | — | — | EP | disclosed |
| EP-0361682-A1 | Halomethyl-1,3,5-triazines containing a photoinitiator moiety | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1990-04-04 | — | — | EP | disclosed |
| EP-0359430-A2 | Halomethyl-1,3,5-triazines containing a monomeric moiety | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1990-03-21 | — | — | EP | disclosed |
| EP-0130939-B1 | USE OF TRIAZINE DERIVATIVES IN THE PROTECTION OF MAIZE AND SORGHUM PLANTS | CIBA-GEIGY AG (CH) | 1988-11-02 | — | — | EP | disclosed |
| US-4523947-A | PLANT SAFENING AGENTS | CIBA-GEIGY CORPORATION (US) | 1985-06-18 | — | — | US | disclosed |
| EP-0130939-A1 | Use of triazine derivatives in the protection of maize and sorghum plants | CIBA-GEIGY AG (CH) | 1985-01-09 | — | — | EP | disclosed |