SCHEMBL7971745

SCHEMBL7971745

Cc1ccc(N)c(N)c1CCCN(C)C

nearest known ligand 0.41

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
NOS1 P29475 5/20 0.40
NOS3 P29474 4/20 0.40
NOS2 P35228 2/20 0.40
RAD52 P43351 1/20 0.36
SIGMAR1 Q99720 1/20 0.35
S100B P04271 1/20 0.34
KCNH2 Q12809 1/20 0.34
TLR8 Q9NR97 1/20 0.34
TLR7 Q9NYK1 1/20 0.34
CD44 P16070 1/20 0.33
HTR7 P34969 1/20 0.33
SKP2 Q13309 1/20 0.33
SLC6A4 P31645 1/20 0.33
CYP1A2 P05177 1/20 0.33
CYP2D6 P10635 1/20 0.33
KMT2A Q03164 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3872243 0.82 NOS1 (0.46) NOS1NOS3NOS2RAD52SIGMAR1
SCHEMBL5260316 0.79 NOS1 (0.34) NOS1NOS3NOS2RAD52SLC6A4
SCHEMBL10425890 0.77 RAD52 (0.40) NOS1NOS3NOS2RAD52CYP1A2
SCHEMBL4884783 0.76 SLC6A4 (0.40) NOS1NOS3NOS2SIGMAR1SLC6A4
SCHEMBL1642010 0.76 NOS1 (0.43) NOS1NOS3NOS2RAD52SIGMAR1
Hydrochloric Acid SCHEMBL3425848 0.74 NOS1 (0.42) NOS1NOS3NOS2RAD52SIGMAR1
SCHEMBL2574713 0.73 CYP2D6 (0.46) NOS1NOS3NOS2TLR8TLR7
SCHEMBL31357517 0.73 CYP2D6 (0.46) NOS1NOS3NOS2TLR8TLR7
SCHEMBL982159 0.71 NOS2 (0.47) NOS3NOS2RAD52S100BCD44
SCHEMBL28208071 0.70 CD44 (0.39) NOS3NOS2S100BCD44

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6204264-B1 Benzimidazole derivative, hair growth promoter and external composition for skin using the same SHISEIDO CO., LTD. (JP) 2001-03-20 US disclosed
EP-0989123-A1 Benzimidazole derivative, hair growth promoter and external composition for skin using the same SHISEIDO COMPANY LIMITED (JP) 2000-03-29 EP disclosed