SCHEMBL7973180

SCHEMBL7973180

CCN(CC)c1ccc(/C=N/c2ccc(OC)c(O)c2)cc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 10/20 0.53
MAPT P10636 8/20 0.53
KDM4E B2RXH2 6/20 0.53
MEN1 O00255 6/20 0.53
KMT2A Q03164 6/20 0.53
LMNA P02545 3/20 0.53
TDP1 Q9NUW8 2/20 0.53
CRHBP P24387 1/20 0.53
CRHR2 Q13324 1/20 0.53
GAA P10253 5/20 0.52
GLA P06280 1/20 0.52
PTGS1 P23219 2/20 0.51
PTGS2 P35354 2/20 0.51
FGFR1 P11362 1/20 0.49
THRB P10828 2/20 0.49
MAPK1 P28482 2/20 0.49
RAB9A P51151 1/20 0.49
CYP1A2 P05177 1/20 0.48
HTT P42858 1/20 0.47
NPSR1 Q6W5P4 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7973182 1.00 ALDH1A1 (0.53) ALDH1A1MAPTKDM4EMEN1KMT2A
SCHEMBL7976733 0.92 PTGS2 (0.60) ALDH1A1MAPTKDM4EMEN1KMT2A
SCHEMBL7976730 0.92 PTGS2 (0.60) ALDH1A1MAPTKDM4EMEN1KMT2A
SCHEMBL7814591 0.79 ALDH1A1 (0.52) ALDH1A1MAPTKDM4EMEN1KMT2A
SCHEMBL7814593 0.79 ALDH1A1 (0.52) ALDH1A1MAPTKDM4EMEN1KMT2A
SCHEMBL7962900 0.78 ALDH1A1 (0.60) ALDH1A1MAPTKDM4EMEN1KMT2A
SCHEMBL11314008 0.78 ALDH1A1 (0.60) ALDH1A1MAPTKDM4EMEN1KMT2A
SCHEMBL11314011 0.78 ALDH1A1 (0.60) ALDH1A1MAPTKDM4EMEN1KMT2A
SCHEMBL7962899 0.78 ALDH1A1 (0.60) ALDH1A1MAPTKDM4EMEN1KMT2A
SCHEMBL1599451 0.77 ALDH1A1 (0.54) ALDH1A1MAPTKDM4EMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6268108-B1 MIXTURE OF COMPOUND FORMING ACID UPON EXPOSURE OF ACTINIC RADIATION, COMPOUND CAPABLE OF CROSSLINKING, DYE AND SOLVENT TOKYO OHKA KOGYO CO., LTD. (JP) 2001-07-31 US disclosed
US-6071673-A Method for the formation of resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2000-06-06 US disclosed