SCHEMBL7976730

SCHEMBL7976730

CCN(CC)c1ccc(/N=C/c2ccc(OC)c(O)c2)cc1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTGS2 P35354 3/20 0.60
PTGS1 P23219 2/20 0.60
MAPT P10636 7/20 0.56
ALDH1A1 P00352 6/20 0.56
MEN1 O00255 6/20 0.56
KMT2A Q03164 6/20 0.56
LMNA P02545 4/20 0.56
KDM4E B2RXH2 4/20 0.56
TDP1 Q9NUW8 2/20 0.56
CRHBP P24387 1/20 0.56
CRHR2 Q13324 1/20 0.56
CYP1A2 P05177 1/20 0.55
MAPK1 P28482 3/20 0.52
GAA P10253 3/20 0.52
THRB P10828 2/20 0.52
HTT P42858 1/20 0.50
NPSR1 Q6W5P4 1/20 0.50
RORC P51449 1/20 0.50
HIF1A Q16665 1/20 0.49
FGFR1 P11362 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7976733 1.00 PTGS2 (0.60) PTGS2PTGS1MAPTALDH1A1MEN1
SCHEMBL7973180 0.92 ALDH1A1 (0.53) PTGS2PTGS1MAPTALDH1A1MEN1
SCHEMBL7973182 0.92 ALDH1A1 (0.53) PTGS2PTGS1MAPTALDH1A1MEN1
SCHEMBL11318692 0.79 ALDH1A1 (0.58) PTGS2PTGS1MAPTALDH1A1MEN1
SCHEMBL11318688 0.79 ALDH1A1 (0.58) PTGS2PTGS1MAPTALDH1A1MEN1
SCHEMBL11314008 0.78 ALDH1A1 (0.60) PTGS2PTGS1MAPTALDH1A1MEN1
SCHEMBL7962900 0.78 ALDH1A1 (0.60) PTGS2PTGS1MAPTALDH1A1MEN1
SCHEMBL11314011 0.78 ALDH1A1 (0.60) PTGS2PTGS1MAPTALDH1A1MEN1
SCHEMBL7962899 0.78 ALDH1A1 (0.60) PTGS2PTGS1MAPTALDH1A1MEN1
SCHEMBL1599451 0.77 ALDH1A1 (0.54) MAPTALDH1A1MEN1KMT2ALMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6268108-B1 MIXTURE OF COMPOUND FORMING ACID UPON EXPOSURE OF ACTINIC RADIATION, COMPOUND CAPABLE OF CROSSLINKING, DYE AND SOLVENT TOKYO OHKA KOGYO CO., LTD. (JP) 2001-07-31 US disclosed
US-6071673-A Method for the formation of resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2000-06-06 US disclosed