SCHEMBL7974520

SCHEMBL7974520

CCN(CC)c1ccc(/C=N/c2ccccc2O)cc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 15/20 0.57
KDM4E B2RXH2 10/20 0.57
GAA P10253 6/20 0.57
MAPT P10636 16/20 0.54
RAB9A P51151 6/20 0.54
NPC1 O15118 5/20 0.54
ESRRG P62508 2/20 0.49
KMT2A Q03164 7/20 0.48
MEN1 O00255 5/20 0.48
LMNA P02545 3/20 0.48
TDP1 Q9NUW8 3/20 0.48
SMN1; SMN2 Q16637 3/20 0.48
POLB P06746 1/20 0.48
HPGD P15428 5/20 0.47
GLA P06280 2/20 0.47
CRHBP P24387 1/20 0.47
CRHR2 Q13324 1/20 0.47
GFER P55789 1/20 0.47
ALDH3A1 P30838 1/20 0.46
ALDH1A3 P47895 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7974522 1.00 ALDH1A1 (0.57) ALDH1A1KDM4EGAAMAPTRAB9A
SCHEMBL7979228 0.83 ALDH1A1 (0.51) ALDH1A1KDM4EGAAMAPTRAB9A
SCHEMBL12416603 0.83 ALDH1A1 (0.62) ALDH1A1KDM4EMAPTRAB9ANPC1
SCHEMBL10415405 0.83 ALDH1A1 (0.62) ALDH1A1KDM4EMAPTRAB9ANPC1
SCHEMBL7962873 0.82 ALDH1A1 (0.54) ALDH1A1KDM4EGAAMAPTRAB9A
SCHEMBL7962875 0.82 ALDH1A1 (0.54) ALDH1A1KDM4EGAAMAPTRAB9A
SCHEMBL14982912 0.82 CA12 (0.57) ALDH1A1KDM4EGAAMAPTRAB9A
SCHEMBL7976665 0.80 ALDH1A1 (0.51) ALDH1A1KDM4EGAAMAPTRAB9A
SCHEMBL7976667 0.80 ALDH1A1 (0.51) ALDH1A1KDM4EGAAMAPTRAB9A
SCHEMBL28352270 0.80 ALDH1A1 (0.56) ALDH1A1KDM4EGAAMAPTRAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6268108-B1 MIXTURE OF COMPOUND FORMING ACID UPON EXPOSURE OF ACTINIC RADIATION, COMPOUND CAPABLE OF CROSSLINKING, DYE AND SOLVENT TOKYO OHKA KOGYO CO., LTD. (JP) 2001-07-31 US disclosed
US-6071673-A Method for the formation of resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2000-06-06 US disclosed