Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 2/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.50 |
| ▸ | ELANE | P08246 | 1/20 | 0.49 |
| ▸ | NPC1 | O15118 | 4/20 | 0.48 |
| ▸ | RAB9A | P51151 | 3/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.48 |
| ▸ | GAA | P10253 | 1/20 | 0.48 |
| ▸ | MAPT | P10636 | 1/20 | 0.48 |
| ▸ | HPGD | P15428 | 1/20 | 0.48 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.48 |
| ▸ | SRC | P12931 | 1/20 | 0.47 |
| ▸ | MEN1 | O00255 | 1/20 | 0.47 |
| ▸ | BLM | P54132 | 1/20 | 0.47 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.47 |
| ▸ | MAOA | P21397 | 7/20 | 0.42 |
| ▸ | MAOB | P27338 | 7/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
| ▸ | UNG | P13051 | 1/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9313699 | 0.91 | POLB (0.46) | POLBALDH1A1ELANENPC1RAB9A | |
| SCHEMBL16959815 | 0.88 | ELANE (0.49) | POLBALDH1A1ELANENPC1RAB9A | |
| SCHEMBL2472047 | 0.86 | ELANE (0.47) | POLBALDH1A1ELANENPC1RAB9A | |
| SCHEMBL8579838 | 0.85 | SRC (0.58) | POLBALDH1A1NPC1RAB9AKMT2A | |
| SCHEMBL13845254 | 0.83 | ELANE (0.51) | POLBALDH1A1ELANENPC1KMT2A | |
| SCHEMBL31738388 | 0.82 | SRC (0.54) | POLBALDH1A1NPC1RAB9AKMT2A | |
| SCHEMBL1035304 | 0.81 | POLB (0.52) | POLBALDH1A1ELANENPC1RAB9A | |
| SCHEMBL6392035 | 0.80 | CYP3A4 (0.62) | POLBALDH1A1ELANEKMT2AMEN1 | |
| SCHEMBL2761992 | 0.80 | ELANE (0.64) | ALDH1A1ELANENPC1RAB9AKMT2A | |
| SCHEMBL2441567 | 0.79 | FBP1 (0.48) | POLBALDH1A1NPC1RAB9AKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6277546-B1 | Process for imaging of photoresist | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-08-21 | — | — | US | disclosed |
| EP-0652488-B1 | Resist materials and related processes | AT & T CORP (US) | 1999-05-19 | — | — | EP | disclosed |
| EP-0596668-B1 | Process for imaging of photoresist | IBM (US) | 1999-04-14 | — | — | EP | disclosed |
| US-5741629-A | POLYMER CONTAINING SUBSTITUTED STYRENE MONOMERS | LUCENT TECHNOLOGIES INC. (US) | 1998-04-21 | — | — | US | disclosed |
| EP-0525626-B1 | Compounds containing acid-cleavable protective groups and positive-working radiation-sensitive compositions prepared using these compounds | HOECHST AG (DE) | 1995-06-14 | — | — | EP | disclosed |
| EP-0652488-A2 | Resist materials and related processes | AT&T Corp. (US) | 1995-05-10 | — | — | EP | disclosed |
| US-5356752-A | Compounds with acid-labile protective groups useful in positive-working radiation-sensitive mixtures | HOECHST AKTIENGESELLSCHAFT (DE) | 1994-10-18 | — | — | US | disclosed |
| EP-0596668-A2 | Process for imaging of photoresist | International Business Machines Corporation (US) | 1994-05-11 | — | — | EP | disclosed |
| EP-0525626-A1 | Compounds containing acid-cleavable protective groups and positive-working radiation-sensitive compositions prepared using these compounds | HOECHST AKTIENGESELLSCHAFT (DE) | 1993-02-03 | — | — | EP | disclosed |