SCHEMBL7993218

SCHEMBL7993218

CCCCCCCCN1C(C)(C)CCCC1(C)C

nearest known ligand 0.43

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
GNAI3 P08754 2/20 0.35
GNAO1 P09471 2/20 0.35
GNAI1 P63096 2/20 0.35
S1PR1 P21453 2/20 0.35
S1PR3 Q99500 2/20 0.35
S1PR5 Q9H228 2/20 0.35
TSHR P16473 1/20 0.35
THRB P10828 1/20 0.35
GUSB P08236 2/20 0.34
EBP Q15125 1/20 0.34
SIGMAR1 Q99720 1/20 0.34
S1PR4 O95977 1/20 0.34
ALOX5 P09917 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10170224 1.00 GNAI3 (0.35) GNAI3GNAO1GNAI1S1PR1S1PR3
SCHEMBL11258797 1.00 GNAI3 (0.35) GNAI3GNAO1GNAI1S1PR1S1PR3
SCHEMBL8585081 1.00 GNAI3 (0.35) GNAI3GNAO1GNAI1S1PR1S1PR3
SCHEMBL9839237 0.98 S1PR1 (0.33) GNAI3GNAO1GNAI1S1PR1S1PR3
SCHEMBL5083427 0.91 TSHR (0.32) S1PR1S1PR3S1PR5TSHR
SCHEMBL10171050 0.91 TSHR (0.34) TSHR
SCHEMBL10170323 0.91 TSHR (0.34) TSHR
SCHEMBL10171052 0.91 TSHR (0.34) TSHR
SCHEMBL10170322 0.89 TSHR (0.35) TSHR
SCHEMBL8476820 0.81 TSHR (0.34) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250382399-A1 ETHYLENE POLYMERISATION PROCESS SABIC GLOBAL TECHNOLOGIES BV (NL) 2025-12-18 US disclosed
EP-4551614-A1 ETHYLENE POLYMERISATION PROCESS SABIC Global Technologies B.V. (NL) 2025-05-14 EP disclosed
WO-2024008538-A1 ETHYLENE POLYMERISATION PROCESS. SABIC GLOBAL TECHNOLOGIES B.V. (NL) 2024-01-11 WO disclosed
EP-2169018-B1 Ink composition and inkjet recording method FUJIFILM CORP (JP) 2012-01-18 EP disclosed
EP-2169022-B1 Ink composition and inkjet recording method FUJIFILM CORP (JP) 2011-11-16 EP disclosed
US-7900558-B2 Radiation-curable polymerizable composition, ink composition, inkjet recording method, printed material, planographic printing plate, and method for forming planographic printing plate FUJIFILM CORPORATION (JP) 2011-03-08 US disclosed
US-7900558-B2 Radiation-curable polymerizable composition, ink composition, inkjet recording method, printed material, planographic printing plate, and method for forming planographic printing plate FUJIFILM CORPORATION (JP) 2011-03-08 US disclosed
US-20100080926-A1 INK COMPOSITION AND INKJET RECORDING METHOD FUJIFILM CORPORATION (JP) 2010-04-01 US disclosed
US-20100080925-A1 INK COMPOSITION AND INKJET RECORDING METHOD FUJIFILM CORPORATION (JP) 2010-04-01 US disclosed
US-20100080925-A1 INK COMPOSITION AND INKJET RECORDING METHOD FUJIFILM CORPORATION (JP) 2010-04-01 US disclosed
US-20080187727-A1 RADIATION-CURABLE POLYMERIZABLE COMPOSITION, INK COMPOSITION, INKJET RECORDING METHOD, PRINTED MATERIAL, PLANOGRAPHIC PRINTING PLATE, AND METHOD FOR FORMING PLANOGRAPHIC PRINTING PLATE FUJIFILM CORPORATION (JP) 2008-08-07 US disclosed
US-20080187727-A1 RADIATION-CURABLE POLYMERIZABLE COMPOSITION, INK COMPOSITION, INKJET RECORDING METHOD, PRINTED MATERIAL, PLANOGRAPHIC PRINTING PLATE, AND METHOD FOR FORMING PLANOGRAPHIC PRINTING PLATE FUJIFILM CORPORATION (JP) 2008-08-07 US disclosed
EP-1952982-A1 Radiation-curable polymerizable composition, ink composition, inkjet recording method, printed material, planographic printing plate, and method for forming planographic printing plate FUJIFILM Corporation (JP) 2008-08-06 EP disclosed
WO-2000015613-A1 METHOD OF MAKING TERTIARY HINDERED AMINES ARISTECH CHEMICAL CORPORATION (US) 2000-03-23 WO disclosed
US-5856491-A REACTING SECONDARY AMINE WITH TERMINALLY UNSATURATED ELECTROPHILIC COMPOUND IN PRESENCE OF N-METHYLPYRROLIDINONE SOLVENT ARISTECH CHEMICAL CORP. (US) 1999-01-05 US disclosed
US-5688951-A Hindered amine light stabilizer ARISTECH CHEMICAL CORP (US) 1997-11-18 US disclosed
US-H1388-H Metathesis polymerizable olefin monomer, procatalyst, procatalyst activator, and at least one of lewis acid catlayst , anionic catalyst, free radical initiator and hydrosilation catalyst HERCULES INCORPORATED (US) 1994-12-06 US disclosed
US-4396735-A N-HETEROCYCLIC COMPOUND AND A HETEROCYCLIC ACID HYDRAZIDE ADEKA ARGUS CHEMICAL CO., LTD. (JP) 1983-08-02 US disclosed
US-4362831-A A HINDERED AND HETEROCYCLIC AMINE WITH A THIOALKANOIC ACID AMIDE ADEKA ARGUS CHEMICAL CO., LTD. (JP) 1982-12-07 US disclosed
US-3975357-A SUBSTITUTED PIPERIDINES SANKYO COMPANY LIMITED (JA) 1976-08-17 US disclosed