SCHEMBL306970

SCHEMBL306970

Nc1ccc(-c2nc(C(Cl)(Cl)Cl)nc(C(Cl)(Cl)Cl)n2)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 6/20 0.46
KMT2A Q03164 6/20 0.46
ALDH1A1 P00352 4/20 0.46
MAPT P10636 3/20 0.46
HPGD P15428 3/20 0.46
NPC1 O15118 7/20 0.42
RAB9A P51151 7/20 0.42
TP53 P04637 2/20 0.42
KDM4E B2RXH2 2/20 0.42
HSD17B10 Q99714 2/20 0.42
SMN1; SMN2 Q16637 2/20 0.42
CYP19A1 P11511 1/20 0.41
CYP3A4 P08684 2/20 0.40
TDP1 Q9NUW8 2/20 0.40
LMNA P02545 3/20 0.40
ATM Q13315 2/20 0.40
GLA P06280 1/20 0.40
PIK3R1 P27986 1/20 0.39
PIK3CA P42336 1/20 0.39
MTOR P42345 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14622036 0.98 MEN1 (0.45) MEN1KMT2AALDH1A1MAPTHPGD
SCHEMBL8412982 0.89 NPC1 (0.38) MEN1KMT2AALDH1A1MAPTHPGD
SCHEMBL80044 0.81 NPC1 (0.52) MEN1KMT2AALDH1A1MAPTNPC1
SCHEMBL125517 0.79 NPC1 (0.50) MEN1KMT2AALDH1A1MAPTHPGD
SCHEMBL130297 0.79 NR1H4 (0.39) MEN1KMT2AALDH1A1NPC1RAB9A
SCHEMBL126470 0.79 RAB9A (0.37) MEN1KMT2AALDH1A1NPC1RAB9A
SCHEMBL8607879 0.79 MEN1 (0.48) MEN1KMT2AALDH1A1MAPTHPGD
SCHEMBL125466 0.79 MEN1 (0.44) MEN1KMT2AALDH1A1MAPTHPGD
SCHEMBL22129836 0.79 NPC1 (0.41) MEN1KMT2AALDH1A1MAPTHPGD
SCHEMBL80269 0.79 NPC1 (0.41) MEN1KMT2AALDH1A1MAPTHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2154162-B1 REACTIVE URETHANE COMPOUND HAVING ETHER BOND, CURABLE COMPOSITION AND CURED MATERIAL SHOWA DENKO KK (JP) 2019-07-17 EP disclosed
EP-2356182-B1 RADIATION CURABLE COATING MATERIALS BASF SE (DE) 2015-05-06 EP disclosed
US-20150079380-A1 OPTICALLY ANISOTROPIC LAYER, METHOD OF MANUFACTURING THE SAME, LAMINATE, METHOD OF MANUFACTURING THE SAME, POLARIZING PLATE, LIQUID CRYSTAL DISPLAY DEVICE, AND ORGANIC EL DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2015-03-19 US disclosed
CN-102216400-B Radiation curable coating materials BASF SE 2013-12-18 CN disclosed
US-20130299736-A1 RADIATION-CURABLE COATING MATERIALS BASE SE (DE) 2013-11-14 US disclosed
US-8431333-B2 Method for removing an uncured photosensitive composition SHOWA DENKO K.K. (JP) 2013-04-30 US disclosed
US-8399569-B2 Reactive urethane compound having ether bond, curable composition, and cured material SHOWA DENKO K.K. (JP) 2013-03-19 US disclosed
US-20120094888-A1 METHOD FOR REMOVING AN UNCURED PHOTOSENSITIVE COMPOSITION SHOWA DENKO K.K. (JP) 2012-04-19 US disclosed
US-8153357-B2 Photosensitive composition remover SHOWA DENKO K.K. (JP) 2012-04-10 US disclosed
EP-1866357-B1 (METH)ACRYLOYL GROUP-CONTAINING AROMATIC ISOCYANATE COMPOUND AND PRODUCTION PROCESS THEREOF SHOWA DENKO KK (JP) 2012-02-22 EP disclosed
US-20080132597-A1 Ethylenically Unsaturated Group-Containing Isocyanate Compound and Process for Producing the Same, and Reactive Monomer, Reactive (Meth) Acrylate Polymer and its Use RESONAC CORPORATION (JP) 2008-06-05 US disclosed
WO-2008058885-A2 RADIATION-HARDENABLE COATING MASSES BASF SE (DE) 2008-05-22 WO disclosed
US-20080026320-A1 PHOTOSENSITIVE PASTE COMPOSITION, BARRIER RIB PREPARED USING THE COMPOSITION AND PLASMA DISPLAY PANEL COMPRISING THE BARRIER RIB SAMSUNG SDI CO., LTD. (KR) 2008-01-31 US disclosed
EP-1870771-A2 Photosensitive paste composition, barrier rib prepared using the composition and plasma display panel comprising the barrier rib Samsung SDI Co., Ltd. (KR) 2007-12-26 EP disclosed
WO-2007138095-A1 USE OF STABILIZING COMPOSITIONS CONTAINING CYANINE CATIONS IN PACKAGING MATERIALS BASF SE (DE) 2007-12-06 WO disclosed
EP-1820064-A2 RADIATION-CURABLE COATING SUBSTANCES BASF AKTIENGESELLSCHAFT (DE) 2007-08-22 EP disclosed
US-20070161530-A1 Photosensitive composition remover SHOWA DENKO K.K. (JP) 2007-07-12 US disclosed
WO-2006058731-A2 RADIATION-CURABLE COATING SUBSTANCES BASF AKTIENGESELLSCHAFT (DE) 2006-06-08 WO disclosed
US-20040157140-A1 Photosensitive coloring composition, color filter using the composition and method of producing the same SHOWA DENKO K.K. (JP) 2004-08-12 US disclosed
US-6110987-A CURED PRODUCTS HAVING AN EXCELLENT APPEARANCE WITHOUT COLORING CAUSED BY POLYMERIZATION INITIATOR SHOWA DENKO K.K. (JP) 2000-08-29 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080132597-A1 Ethylenically Unsaturated Group-Containing Isocyanate Compound and Process for Producing the Same, and Reactive Monomer, Reactive (Meth) Acrylate Polymer and its Use ACAD9, ELOVL6, ELOVL5 MEN1 1084/4885KMT2A 2833/4885ALDH1A1 119/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.