SCHEMBL8004553

SCHEMBL8004553

Cc1ccc(C(OC(C)C)OC(C)C)cc1

nearest known ligand 0.46

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
CHRNA7 P36544 1/20 0.46
ACHE P22303 6/20 0.40
TDP1 Q9NUW8 1/20 0.40
ALOX5 P09917 1/20 0.35
STAT3 P40763 1/20 0.32
CYP19A1 P11511 1/20 0.32
ALDH1A1 P00352 2/20 0.32
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
CA7 P43166 1/20 0.32
CA9 Q16790 1/20 0.32
LMNA P02545 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
MEN1 O00255 1/20 0.31
GAA P10253 1/20 0.31
KMT2A Q03164 1/20 0.31
TAS1R3 Q7RTX0 1/20 0.31
TAS1R1 Q7RTX1 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8750619 0.80 CHRNA7 (0.46) CHRNA7ACHETDP1ALOX5STAT3
SCHEMBL6202387 0.78 IDO1 (0.43) ACHE
SCHEMBL3102669 0.77 TAAR1 (0.41) ALDH1A1LMNA
SCHEMBL28346241 0.75 PTGS2 (0.48) ALDH1A1GAA
SCHEMBL2431139 0.74 ACHE (0.44) CHRNA7ACHETDP1CYP19A1ALDH1A1
SCHEMBL8750364 0.74 CHRNA7 (0.50) CHRNA7ACHETDP1ALOX5STAT3
SCHEMBL16406583 0.73 MAPT (0.45) ACHEALDH1A1GAAKMT2A
SCHEMBL8750611 0.73 CHRNA7 (0.40) CHRNA7ACHETDP1ALOX5STAT3
SCHEMBL27273704 0.73 ACHE (0.44) ACHECYP19A1ALDH1A1GAA
SCHEMBL20220566 0.72 CHRNA7 (0.39) CHRNA7ACHETDP1ALOX5STAT3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112292431-B Crystal cutting and crystal bonding integrated film and pressure-sensitive adhesive film used by same 昭和电工材料株式会社 2022-09-02 CN disclosed
CN-114730706-A Method for manufacturing semiconductor device, dicing die-bonding integrated film, and method for manufacturing the same 昭和电工材料株式会社 2022-07-08 CN disclosed
CN-113348533-B Method for evaluating pickup property, die-cut/die-bond integrated film, method for evaluating the same, method for sorting the same, and method for manufacturing semiconductor device 昭和电工材料株式会社 2022-06-03 CN disclosed
CN-113366621-B Method for evaluating pickup property, die-cut and die-bond integrated film, method for evaluating die-cut and die-bond integrated film, method for sorting die-cut and die-bond integrated film, and method for manufacturing semiconductor device 昭和电工材料株式会社 2021-12-31 CN disclosed
CN-112219264-B Die-cut/die-bond integrated film, method for producing same, and method for producing semiconductor device 昭和电工材料株式会社 2021-12-03 CN disclosed
CN-113366621-A Method for evaluating pickup property, die-cut and die-bond integrated film, method for evaluating die-cut and die-bond integrated film, method for sorting die-cut and die-bond integrated film, and method for manufacturing semiconductor device 昭和电工材料株式会社 2021-09-07 CN disclosed
CN-113348533-A Method for evaluating pickup property, die-cut and die-bond integrated film, method for evaluating die-cut and die-bond integrated film, method for sorting die-cut and die-bond integrated film, and method for manufacturing semiconductor device 昭和电工材料株式会社 2021-09-03 CN disclosed
WO-2021095369-A1 INTEGRATED DICING/DIE-BONDING FILM, METHOD FOR MANUFACTURING SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 昭和電工マテリアルズ株式会社 2021-05-20 WO disclosed
WO-2021095370-A1 DICING DIE-BONDING INTEGRATED FILM, PRODUCTION METHOD THEREFOR, AND SEMICONDUCTOR DEVICE PRODUCTION METHOD 昭和電工マテリアルズ株式会社 2021-05-20 WO disclosed
CN-112292431-A Crystal cutting and crystal bonding integrated film and pressure-sensitive adhesive film used by same 昭和电工材料株式会社 2021-01-29 CN disclosed
CN-1156532-C Epoxy-resin composition and use thereof 三井化学株式会社 2004-07-07 CN disclosed
CN-1400993-A Adhesive composition, method for producing same, adhesive film using same, substrate for mounting semiconductor, and semiconductor device HITACHI CHEMICAL CO LTD (JP) 2003-03-05 CN disclosed
US-6080522-A CONTAINING PHOTORESIST AND POLYMER CLARIANT INTERNAITONAL, LTD. (CH) 2000-06-27 US disclosed
CN-1239116-A Epoxy-resin composition and use thereof MITSUI CHEMICALS INC (US) 1999-12-22 CN disclosed
CN-1229480-A Radiation-sensitive resist composition with high heat resistance CLARIANT INT LTD (CH) 1999-09-22 CN disclosed
CN-1062544-A The compositions of thermosetting resin that contains arylamino resin MITSUI TOATSU CHEMICALS (JP) 1992-07-08 CN disclosed
CN-1017055-B Process for producing aromatic amine resin MITSUI TOATSU CHEMICALS (JP) 1992-06-17 CN disclosed
US-5068293-A Heat resistant and moisture resistant epoxy resin for molding materials NIPPON STEEL CHEMICAL CO., LTD. (JP) 1991-11-26 US disclosed
EP-0415790-A2 Naphthol-based epoxy resins, intermediates for the same, process for preparing the same, and epoxy resin compositions containing the same NIPPON STEEL CHEMICAL CO., LTD. (JP) 1991-03-06 EP disclosed
CN-1032806-A Aromatic amine resin, its preparation method and application in thermosetting resin composition MITSUI TOATSU CHEMICALS (JP) 1989-05-10 CN disclosed