Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8348752 | 0.71 | — | — | |
| SCHEMBL7861857 | 0.67 | — | — | |
| SCHEMBL1565415 | 0.65 | — | — | |
| SCHEMBL2074979 | 0.65 | MAPK1 (0.35) | MAPK1 | |
| SCHEMBL2074977 | 0.65 | MAPK1 (0.35) | MAPK1 | |
| SCHEMBL5797570 | 0.62 | — | — | |
| SCHEMBL9998063 | 0.62 | — | — | |
| SCHEMBL17523425 | 0.61 | MAPK1 (0.44) | MAPK1 | |
| SCHEMBL12217041 | 0.60 | MAPK1 (0.33) | MAPK1 | |
| SCHEMBL10781150 | 0.60 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0737897-A1 | Wet developable etch resistant photoresist for UV-exposure at wavelength below 200 nm | OCG Microelectronic Materials Inc. (US) | 1996-10-16 | — | — | EP | claimed |
| US-6063549-A | COMPRISING AN ACID-GENERATING COMPOUND, A FILM-FORMING BINDER HAVING GROUPS CLEAVABLE BY ACID CATALYSIS, A COMPOUND WITH LATENT AROMATIC GROUPS AND A FILM-FORMING BINDER WITH LATENT AROMATIC GROUPS | ARCH SPECIALTY CHEMICALS, INC. (US) | 2000-05-16 | — | — | US | disclosed |
| US-6063549-A | COMPRISING AN ACID-GENERATING COMPOUND, A FILM-FORMING BINDER HAVING GROUPS CLEAVABLE BY ACID CATALYSIS, A COMPOUND WITH LATENT AROMATIC GROUPS AND A FILM-FORMING BINDER WITH LATENT AROMATIC GROUPS | ARCH SPECIALTY CHEMICALS, INC. (US) | 2000-05-16 | — | — | US | disclosed |
| EP-0737897-A1 | Wet developable etch resistant photoresist for UV-exposure at wavelength below 200 nm | OCG Microelectronic Materials Inc. (US) | 1996-10-16 | — | — | EP | disclosed |
| EP-0737897-A1 | Wet developable etch resistant photoresist for UV-exposure at wavelength below 200 nm | OCG Microelectronic Materials Inc. (US) | 1996-10-16 | — | — | EP | disclosed |