SCHEMBL15869181

CCOC(C)Oc1ccc(C2(c3ccc(OC(C)OCC)cc3)CCC(C(C)(C)C3CCC(c4ccc(OC(C)OCC)cc4)(c4ccc(OC(C)OCC)cc4)CC3)CC2)cc1

nearest known ligand 0.34

Predicted protein targets (top 1)

	gene	UniProt	supporting neighbours	confidence
▸	ADORA3	P0DMS8	1/20	0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compound	similarity	top predicted	shared targets
SCHEMBL15869192	0.83	DRD2 (0.33)	ADORA3
SCHEMBL15869202	0.82	ADORA3 (0.43)	ADORA3
SCHEMBL15869191	0.80	ADORA3 (0.45)	ADORA3
SCHEMBL8015407	0.78	—	—
SCHEMBL15869180	0.75	ADORA3 (0.46)	ADORA3
SCHEMBL15869205	0.74	SLC6A4 (0.44)	ADORA3
SCHEMBL3852488	0.72	LMNA (0.52)	—
SCHEMBL15869193	0.70	MAPT (0.39)	ADORA3
SCHEMBL15934080	0.69	ALDH1A1 (0.55)	—
SCHEMBL15869194	0.69	GPR174 (0.37)	ADORA3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

Patent	Title	Assignee	Published	Priority	Filing	Country	Status
US-9377690-B2	Compositon for forming metal oxide-containing film and patterning process	SHIN-ETSU CHEMICAL CO., LTD. (JP)	2016-06-28	—	—	US	disclosed
US-9377690-B2	Compositon for forming metal oxide-containing film and patterning process	SHIN-ETSU CHEMICAL CO., LTD. (JP)	2016-06-28	—	—	US	disclosed
US-20140193757-A1	COMPOSITON FOR FORMING METAL OXIDE-CONTAINING FILM AND PATTERNING PROCESS	SHIN-ETSU CHEMICAL CO., LTD. (JP)	2014-07-10	—	—	US	disclosed
US-20140193757-A1	COMPOSITON FOR FORMING METAL OXIDE-CONTAINING FILM AND PATTERNING PROCESS	SHIN-ETSU CHEMICAL CO., LTD. (JP)	2014-07-10	—	—	US	disclosed