SCHEMBL801657

SCHEMBL801657

CCC(C)(C)C(=O)OCCOC(=O)CC(C)=O

nearest known ligand 0.40

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
MGAM O43451 2/20 0.40
GAA P10253 2/20 0.40
SI P14410 2/20 0.40
MGAM2 Q2M2H8 2/20 0.40
DGKA P23743 1/20 0.33
CYP4F2 P78329 1/20 0.33
CYP4A11 Q02928 1/20 0.33
FAAH O00519 1/20 0.32
ALDH1A1 P00352 1/20 0.31
TSHR P16473 1/20 0.31
ACHE P22303 1/20 0.30
KDM4E B2RXH2 1/20 0.30
PKM P14618 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14727468 0.85 MGAM (0.40) MGAMGAASIMGAM2DGKA
SCHEMBL18155232 0.85 MGAM (0.35) MGAMGAASIMGAM2DGKA
SCHEMBL824523 0.84 CYP4F2 (0.41) GAADGKACYP4F2CYP4A11ALDH1A1
SCHEMBL15249136 0.82 GAA (0.44) MGAMGAASIMGAM2DGKA
SCHEMBL18368238 0.82 NAAA (0.45) MGAMGAASIMGAM2DGKA
SCHEMBL13557205 0.82 DGKA (0.45) DGKACYP4F2CYP4A11ALDH1A1TSHR
SCHEMBL14265861 0.82 MGAM (0.38) MGAMGAASIMGAM2DGKA
SCHEMBL16180946 0.82 THRB (0.33) CYP4F2CYP4A11
SCHEMBL13998495 0.81 DGKA (0.41) MGAMGAASIMGAM2DGKA
SCHEMBL14582700 0.81 TET2 (0.34) MGAMGAASIMGAM2DGKA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 522 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11841521-B2 Optical film, circularly polarizing plate, and organic electroluminescence display device FUJIFILM CORPORATION (JP) 2023-12-12 US disclosed
US-11820162-B2 Pretreatment liquid, ink set, base material for image recording, method of producing base material for image recording, image recording material, and image recording method FUJIFILM CORPORATION (JP) 2023-11-21 US disclosed
US-11820930-B2 Polymer compound, liquid crystal composition, phase difference layer, optical film, polarizing plate, and image display device FUJIFILM CORPORATION (JP) 2023-11-21 US disclosed
US-20230273360-A1 PHASE DIFFERENCE PLATE, PHASE DIFFERENCE PLATE WITH TEMPORARY SUPPORT, CIRCULARLY POLARIZING PLATE, AND DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2023-08-31 US disclosed
US-20230276683-A1 ORGANIC ELECTROLUMINESCENT DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2023-08-31 US disclosed
US-11733435-B2 Polarizing plate protective film, polarizing plate, and liquid crystal display device FUJIFILM CORPORATION (JP) 2023-08-22 US disclosed
US-20230213695-A1 LAMINATES, POLARIZING PLATES, AND IMAGE DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2023-07-06 US disclosed
US-20230213823-A1 LIGHT ABSORPTION ANISOTROPIC FILM, LAMINATE, AND IMAGE DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2023-07-06 US disclosed
US-20230212460-A1 COMPOSITION FOR FORMING PHOTO-ALIGNMENT FILM, PHOTO-ALIGNMENT FILM, AND OPTICAL LAMINATE FUJIFILM CORPORATION (JP) 2023-07-06 US disclosed
US-20230204838-A1 OPTICAL FILM, CIRCULARLY POLARIZING PLATE, AND ORGANIC ELECTROLUMINESCENT DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2023-06-29 US disclosed
US-7300740-B2 Lithographic printing plate precursor and lithographic printing method FUJIFILM CORPORATION (JP) 2007-11-27 US disclosed
US-20070224535-A1 Image Forming Method, Planographic Printing Plate Precursor, and Planographic Printing Method FUJIFILM CORPORATION (JP) 2007-09-27 US disclosed
US-20070207411-A1 Method for preparation of lithographic printing plate and lithographic printing plate precursor FUJIFILM CORPORATION (JP) 2007-09-06 US disclosed
US-20070202439-A1 Polymerizable composition and planographic printing plate precursor FUJIFILM CORPORATION 2007-08-30 US disclosed
US-7252924-B2 Positive resist composition and method of pattern formation using the same FUJIFILM CORPORATION (JP) 2007-08-07 US disclosed
US-20070178405-A1 Positive resist composition and method of pattern formation with the same FUJI PHOTO FILM CO., LTD. 2007-08-02 US disclosed
US-20070172769-A1 Pattern forming method FUJIFILM CORPORATION (JP) 2007-07-26 US disclosed
US-7232644-B2 Polymerizable composition and negative-working planographic printing plate precursor using the same FUJIFILM CORPORATION (JP) 2007-06-19 US disclosed
US-20070072116-A1 comprising hydrophilic support, undercoat layer and laser-sensitive photopolymerizable layer, wherein undercoat layer contains copolymer containing a repeating unit having at least one ethylenically unsaturated bond and repeating unit having functional group capable of interacting with surface of support FUJI PHOTO FILM CO., LTD. 2007-03-29 US disclosed
US-20070059639-A1 Positive resist composition and pattern-forming method using the same FUJI PHOTO FILM CO., LTD. 2007-03-15 US disclosed