SCHEMBL8028971

SCHEMBL8028971

O=S(=O)(c1ccc(O)cc1)S(=O)(=O)c1ccc(O)cc1

nearest known ligand 0.65

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.65
CA2 P00918 7/20 0.62
CA1 P00915 5/20 0.62
CA12 O43570 3/20 0.62
CA9 Q16790 3/20 0.62
ENPP2 Q13822 1/20 0.62
HPGD P15428 3/20 0.50
ALDH1A1 P00352 2/20 0.50
CYP3A4 P08684 2/20 0.50
ALOX15 P16050 2/20 0.50
RECQL P46063 2/20 0.50
HIF1A Q16665 2/20 0.50
HSD17B10 Q99714 2/20 0.50
MAPT P10636 2/20 0.50
KDM4E B2RXH2 1/20 0.50
MEN1 O00255 1/20 0.50
NPC1 O15118 1/20 0.50
GMNN O75496 1/20 0.50
CA3 P07451 1/20 0.50
TYR P14679 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL547730 1.00 LMNA (0.65) LMNACA2CA1CA12CA9
SCHEMBL18838 0.81 GAA (0.67) LMNACA2CA1CA12CA9
SCHEMBL3792342 0.81 GAA (0.67) LMNACA2CA1CA12CA9
SCHEMBL124022 0.81 GAA (0.67) LMNACA2CA1CA12CA9
SCHEMBL29724901 0.81 GAA (0.67) LMNACA2CA1CA12CA9
Water SCHEMBL6425932 0.79 GAA (0.64) LMNACA2CA1CA12CA9
Hydrochloric Acid SCHEMBL10624747 0.79 GAA (0.64) LMNACA2CA1CA12CA9
SCHEMBL4737577 0.79 LMNA (0.62) LMNACA2CA1CA12CA9
SCHEMBL21095944 0.79 LMNA (0.62) LMNACA2CA1CA12CA9
Potassium SCHEMBL11745543 0.79 GAA (0.64) LMNACA2CA1CA12CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0762207-B1 Positive working photosensitive composition and method of producing relief structures BASF AG (DE) 2000-04-12 EP disclosed
EP-0616258-B1 Radiation sensitive composition and process for forming relief structures with improved contrast BASF AG (DE) 1997-05-21 EP disclosed
EP-0762207-A2 Positive working photosensitive composition and method of producing relief structures BASF AKTIENGESELLSCHAFT (DE) 1997-03-12 EP disclosed
EP-0616258-A1 Radiation sensitive composition and process for forming relief structures with improved contrast BASF Aktiengesellschaft (DE) 1994-09-21 EP disclosed