SCHEMBL8030664

SCHEMBL8030664

CCCCn1c(=S)sc2ccccc21

nearest known ligand 0.56

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
DRD2 P14416 1/20 0.52
SLC6A4 P31645 1/20 0.52
SLC6A3 Q01959 1/20 0.52
PGR P06401 1/20 0.44
RORA P35398 1/20 0.44
RORC P51449 1/20 0.44
RORB Q92753 1/20 0.44
ALDH1A1 P00352 1/20 0.44
CYP1A2 P05177 1/20 0.44
HPGD P15428 1/20 0.44
HSD17B10 Q99714 1/20 0.44
F12 P00748 1/20 0.43
TLR8 Q9NR97 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6741877 0.94 DRD2 (0.53) DRD2SLC6A4SLC6A3TLR8
SCHEMBL11776240 0.94 DRD2 (0.53) DRD2SLC6A4SLC6A3TLR8
SCHEMBL11782096 0.90 DRD2 (0.48) DRD2SLC6A4SLC6A3ALDH1A1CYP1A2
SCHEMBL14136137 0.83 DRD2 (0.52) DRD2SLC6A4SLC6A3ALDH1A1CYP1A2
SCHEMBL513869 0.82 ALDH1A1 (0.48) DRD2SLC6A4SLC6A3ALDH1A1CYP1A2
SCHEMBL4617266 0.80 CYP3A4 (0.64) CYP1A2HPGD
Iodide SCHEMBL965881 0.80 F12 (0.56) PGRRORARORCRORBALDH1A1
SCHEMBL6547890 0.79 ALDH1A1 (0.49) DRD2SLC6A4SLC6A3ALDH1A1CYP1A2
SCHEMBL19456499 0.79 ALDH1A1 (0.52) ALDH1A1CYP1A2HPGDHSD17B10
SCHEMBL9627804 0.78 KCNH2 (0.41) DRD2SLC6A4SLC6A3ALDH1A1CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5910391-A SUBJECTING PLATE TO EXPOSURE, TREATING WITH DEVELOPING SOLUTION, AND WASHING WITH NITROGEN-CONTAINING HETEROCYCLE COMPOUND HAVING MERCAPTO OR THIONE GROUP MITSUBISHI PAPER MILLS LIMITED (JP) 1999-06-08 US claimed
US-5851723-A Process for making lithographic printing plate MITSUBISHI PAPER MILLS LIMITED (JP) 1998-12-22 US claimed
US-6063540-A USING BOTH A THIOETHER COMPOUND OR OLIGOMER AND ALKANOLAMINE TO LOWER THE TEMPERATURE DEPENDENCE OF DEVELOPER COATED ON A SILVER HALIDE EMULSION LAYER AND PHYSICAL DEVELOPMENT MUCLEI LAYER; CONTRAST; ANTISOILANTS; DURABILITY MITSUBISHI PAPER MILLS LIMITED (JP) 2000-05-16 US disclosed
US-6060209-A AFTER EXPOSURE TREATING USING DEVELOPING SOLUTION, WASHING SOLUTION AND FINISHING SOLUTION APPLIED IN THIS ORDER, COMPRISING AMINE, AMIDE, OR QUATERNARY AMMONIUM COMPOUNDS HAVING A PROPYLENEOXY GROUP AND AN ETHYLENEOXY GROUP MITSUBISHI PAPER MILLS LIMITED (JP) 2000-05-09 US disclosed
US-5910391-A SUBJECTING PLATE TO EXPOSURE, TREATING WITH DEVELOPING SOLUTION, AND WASHING WITH NITROGEN-CONTAINING HETEROCYCLE COMPOUND HAVING MERCAPTO OR THIONE GROUP MITSUBISHI PAPER MILLS LIMITED (JP) 1999-06-08 US disclosed
US-5902719-A IMPROVED RESOLUTION FOR SCANNING TYPE EXPOSURE USING A PLATE HAVING PHYSICAL DEVELOPMENT NUCLEI LAYER BETWEEN AN ALUMINUM SUPPORT AND A SILVER HALIDE EMULSION LAYER AND PROCESSING IN THE PRESENCE OF A MONOCYCLIC AZOLE, FREE OF A MERCAPTAN MITSUBISHI PAPER MILLS LIMITED (JP) 1999-05-11 US disclosed
US-5853950-A Process for making lithographic printing plate MITSUBISHI PAPER MILLS LIMITED (JP) 1998-12-29 US disclosed
US-5851723-A Process for making lithographic printing plate MITSUBISHI PAPER MILLS LIMITED (JP) 1998-12-22 US disclosed