Known targets — ChEMBL curated mechanism
ACEADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2BTKCACNA1CCACNA1DCACNA1FCACNA1SCCR5CPT1BCPT2DPP4DRD1DRD2EGFRERBB2ERBB4HRH1HRH3HTR1AHTR2AHTR2BHTR2CHTR4JAK1JAK2JAK3MPLMTORPPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PPARGSLC6A2SLC6A3SLC6A4SMOTYK2pol
The experimentally established mechanism targets of Maleic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PPARG known ✓ | P37231 | 2/20 | 0.39 |
| ▸ | EGFR known ✓ | P00533 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.40 |
| ▸ | ALOX5 | P09917 | 4/20 | 0.39 |
| ▸ | PTGES | O14684 | 3/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.35 |
| ▸ | APEX1 | P27695 | 1/20 | 0.34 |
| ▸ | ELANE | P08246 | 1/20 | 0.34 |
| ▸ | AKR1C3 | P42330 | 2/20 | 0.33 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.33 |
| ▸ | CES2 | O00748 | 1/20 | 0.33 |
| ▸ | CES1 | P23141 | 1/20 | 0.33 |
| ▸ | RECQL | P46063 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Itaconate SCHEMBL8049791 | 0.88 | LMNA (0.38) | LMNATDP1ALOX5PTGESPPARG | |
| Styrene SCHEMBL9146365 | 0.84 | MEN1 (0.36) | LMNATDP1ALOX5PTGESPPARG | |
| SCHEMBL294650 | 0.84 | CYP3A4 (0.42) | LMNATDP1PPARGCYP3A4CYP2C9 | |
| SCHEMBL5249714 | 0.84 | LMNA (0.53) | LMNATDP1ALOX5PTGESPPARG | |
| SCHEMBL2042270 | 0.80 | LMNA (0.49) | LMNATDP1ALOX5PTGESPPARG | |
| SCHEMBL9785974 | 0.79 | LMNA (0.48) | LMNATDP1ALOX5PTGESPPARG | |
| SCHEMBL3082168 | 0.79 | LMNA (0.48) | LMNATDP1ALOX5PTGESPPARG | |
| SCHEMBL7744013 | 0.79 | CYP2C9 (0.42) | LMNACYP3A4CYP2C9HTTAKR1C3 | |
| SCHEMBL182732 | 0.79 | LMNA (0.43) | LMNATDP1ALOX5PTGESPPARG | |
| SCHEMBL10685052 | 0.79 | TDP1 (0.60) | LMNATDP1ALOX5PTGESPPARG |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0749594-B1 | STABLE, IONOMERIC PHOTORESIST EMULSION AND PROCESS OF PREPARATION AND USE THEREOF | MACDERMID INC (US) | 2000-04-12 | — | — | EP | claimed |
| US-5981147-A | Stable, ionomeric photoresist emulsion and process of preparation and use thereof | MAC DERMID INCORPORATED (US) | 1999-11-09 | — | — | US | claimed |
| EP-0749594-A4 | STABLE, IONOMERIC PHOTORESIST EMULSION AND PROCESS OF PREPARATION AND USE THEREOF | GRACE W R & CO (US) | 1997-07-23 | — | — | EP | claimed |
| EP-0749594-A1 | STABLE, IONOMERIC PHOTORESIST EMULSION AND PROCESS OF PREPARATION AND USE THEREOF | W.R. Grace & Co.-Conn. (US) | 1996-12-27 | — | — | EP | claimed |
| WO-1995024674-A1 | STABLE, IONOMERIC PHOTORESIST EMULSION AND PROCESS OF PREPARATION AND USE THEREOF | W.R. GRACE & CO.-CONN. (US) | 1995-09-14 | — | — | WO | claimed |
| US-5232815-A | Corrosion resistance | W. R. GRACE & CO.-CONN. (US) | 1993-08-03 | — | — | US | claimed |
| EP-0749594-B1 | STABLE, IONOMERIC PHOTORESIST EMULSION AND PROCESS OF PREPARATION AND USE THEREOF | MACDERMID INC (US) | 2000-04-12 | — | — | EP | disclosed |
| US-5981147-A | Stable, ionomeric photoresist emulsion and process of preparation and use thereof | MAC DERMID INCORPORATED (US) | 1999-11-09 | — | — | US | disclosed |
| US-5869220-A | MIXING AND COMMINUTING A PARTIALLY NEUTRALIZED ACID FUNCTIONAL LATEX POLYMER RESIN WITH PHOTOPOLYMERIZABLE MONOMERS AND PHOTOINITIATORS UNDER CONDITIONS SUFFICIENT TO PRODUCE A STABLE EMULSION. | MACDERMID ACUMEN, INC. (US) | 1999-02-09 | — | — | US | disclosed |
| EP-0749594-A4 | STABLE, IONOMERIC PHOTORESIST EMULSION AND PROCESS OF PREPARATION AND USE THEREOF | GRACE W R & CO (US) | 1997-07-23 | — | — | EP | disclosed |
| EP-0749594-A1 | STABLE, IONOMERIC PHOTORESIST EMULSION AND PROCESS OF PREPARATION AND USE THEREOF | W.R. Grace & Co.-Conn. (US) | 1996-12-27 | — | — | EP | disclosed |
| WO-1996041240-A1 | WATER PHOTORESIST EMULSIONS AND METHODS OF PREPARATION THEREOF | W.R. GRACE & CO.-CONN. (US) | 1996-12-19 | — | — | WO | disclosed |
| US-5508141-A | AQUEOUS ACIDIC PHOTORESIST EMULSION CONTAINING RESIN, POSITIVE-ACTING PHOTOACTIVE FUNCTIONALITY, ACID, OXIDIZING AGENT, SURFACTANT | W. R. GRACE & CO.-CONN. (US) | 1996-04-16 | — | — | US | disclosed |
| WO-1995024674-A1 | STABLE, IONOMERIC PHOTORESIST EMULSION AND PROCESS OF PREPARATION AND USE THEREOF | W.R. GRACE & CO.-CONN. (US) | 1995-09-14 | — | — | WO | disclosed |
| US-5232815-A | Corrosion resistance | W. R. GRACE & CO.-CONN. (US) | 1993-08-03 | — | — | US | disclosed |
| EP-0518453-A1 | A method of making electrical circuit traces | W.R. Grace & Co.-Conn. (US) | 1992-12-16 | — | — | EP | disclosed |