SCHEMBL8046857

SCHEMBL8046857

Cc1ccccc1S(=O)(=O)c1ccc(O)c(S(=O)(=O)c2ccccc2)c1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 4/20 0.61
POLB P06746 4/20 0.61
GFER P55789 1/20 0.61
ALDH1A1 P00352 4/20 0.55
PKM P14618 1/20 0.55
L3MBTL1 Q9Y468 2/20 0.55
HSD11B1 P28845 1/20 0.51
SMN1; SMN2 Q16637 3/20 0.47
MAPT P10636 1/20 0.47
MEN1 O00255 3/20 0.47
KMT2A Q03164 3/20 0.47
PABPC1 P11940 1/20 0.47
ATM Q13315 1/20 0.47
ERAP1 Q9NZ08 1/20 0.47
ESR1 P03372 1/20 0.46
ESR2 Q92731 1/20 0.46
SFRP1 Q8N474 1/20 0.46
ABCC9 O60706 1/20 0.45
ABCC8 Q09428 1/20 0.45
KCNJ11 Q14654 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8059403 0.94 GAA (0.58) GAAPOLBGFERALDH1A1PKM
SCHEMBL6534882 0.87 GAA (0.73) GAAPOLBGFERALDH1A1PKM
SCHEMBL660467 0.87 GAA (0.73) GAAPOLBGFERALDH1A1PKM
SCHEMBL8057518 0.87 L3MBTL1 (0.58) GAAPOLBGFERALDH1A1PKM
SCHEMBL8062004 0.87 L3MBTL1 (0.58) GAAPOLBGFERALDH1A1PKM
SCHEMBL8062016 0.86 ALDH1A1 (0.70) GAAPOLBGFERALDH1A1PKM
SCHEMBL8046908 0.86 ALDH1A1 (0.70) GAAPOLBGFERALDH1A1PKM
SCHEMBL8047007 0.86 L3MBTL1 (0.68) GAAPOLBGFERALDH1A1PKM
SCHEMBL8057552 0.86 L3MBTL1 (0.68) GAAPOLBGFERALDH1A1PKM
SCHEMBL6215926 0.85 L3MBTL1 (0.53) GAAPOLBGFERALDH1A1PKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6040470-A DERIVATIVES OF 1-ORGANOETHER,-ESTER OR SULFONE-2,4-BIS-PHENYLSULFONYL)BENZENE IN AN AQUEOUS DEVELOPER SLURRY TO PREVENT DETERIORATION OF DISPERSION DUE TO HYDRATION; HIGHLY SENSITIVE; LESS SURFACE BLUSHING; STORAGE STABILITY OF IMAGE SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 2000-03-21 US disclosed
EP-0791578-B1 Sulfonyl compound and thermalsensitive recording medium using the same SANKO KAIHATSU KAGAKU KENK (JP) 1999-11-10 EP disclosed
US-5840652-A HIGH SENSITIVITY, STORAGE STABILITY SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 1998-11-24 US disclosed
EP-0706997-B1 Sulfonyl compound and thermal-sensitive recording medium using the same SANKO KAIHATSU KAGAKU KENK (JP) 1998-03-11 EP disclosed
US-5705452-A AS DEVELOPER; HIGH SENSITIVITY, LOW BACKGROUND BLUSH DURING STORAGE, RESISTANCE TO HEAT, MOISTURE, PLASTICIZER SANKO HAIHATSU KAGAKU KENKYUSHO (JP) 1998-01-06 US disclosed
EP-0791578-A2 Sulfonyl compound and thermalsensitive recording medium using the same Sanko Kaihatsu Kagaku Kenkyusho (JP) 1997-08-27 EP disclosed
EP-0706997-A1 Sulfonyl compound and thermal-sensitive recording medium using the same Sanko Kaihatsu Kagaku Kenkyusho (JP) 1996-04-17 EP disclosed