SCHEMBL8046878

SCHEMBL8046878

CCc1cc(O)c(S(=O)(=O)c2ccc(C)cc2)cc1S(=O)(=O)c1ccccc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 2/20 0.54
GAA P10253 4/20 0.49
POLB P06746 2/20 0.49
GFER P55789 1/20 0.49
MEN1 O00255 4/20 0.44
KMT2A Q03164 4/20 0.44
ALDH1A1 P00352 4/20 0.43
HTT P42858 2/20 0.43
MAPT P10636 2/20 0.43
USP2 O75604 1/20 0.43
NPSR1 Q6W5P4 2/20 0.43
RECQL P46063 2/20 0.42
HSD11B1 P28845 1/20 0.42
COMT P21964 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
APOBEC3A P31941 1/20 0.41
APOBEC3G Q9HC16 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
PABPC1 P11940 1/20 0.41
ATM Q13315 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8059447 1.00 L3MBTL1 (0.54) L3MBTL1GAAPOLBGFERMEN1
SCHEMBL8059394 0.94 L3MBTL1 (0.49) L3MBTL1GAAPOLBMEN1KMT2A
SCHEMBL8046743 0.93 POLB (0.56) L3MBTL1GAAPOLBGFERMEN1
SCHEMBL8530237 0.87 POLB (0.52) L3MBTL1GAAPOLBGFERMEN1
SCHEMBL8064276 0.87 POLB (0.48) L3MBTL1GAAPOLBGFERMEN1
SCHEMBL8059300 0.87 POLB (0.48) L3MBTL1GAAPOLBGFERMEN1
SCHEMBL8529019 0.87 POLB (0.52) L3MBTL1GAAPOLBGFERMEN1
SCHEMBL10786726 0.85 POLB (0.53) L3MBTL1GAAPOLBGFERMEN1
SCHEMBL8062020 0.84 L3MBTL1 (0.58) L3MBTL1GAAPOLBGFERMEN1
SCHEMBL8062013 0.84 L3MBTL1 (0.58) L3MBTL1GAAPOLBGFERMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6040470-A DERIVATIVES OF 1-ORGANOETHER,-ESTER OR SULFONE-2,4-BIS-PHENYLSULFONYL)BENZENE IN AN AQUEOUS DEVELOPER SLURRY TO PREVENT DETERIORATION OF DISPERSION DUE TO HYDRATION; HIGHLY SENSITIVE; LESS SURFACE BLUSHING; STORAGE STABILITY OF IMAGE SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 2000-03-21 US disclosed
EP-0791578-B1 Sulfonyl compound and thermalsensitive recording medium using the same SANKO KAIHATSU KAGAKU KENK (JP) 1999-11-10 EP disclosed
US-5840652-A HIGH SENSITIVITY, STORAGE STABILITY SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 1998-11-24 US disclosed
EP-0706997-B1 Sulfonyl compound and thermal-sensitive recording medium using the same SANKO KAIHATSU KAGAKU KENK (JP) 1998-03-11 EP disclosed
US-5705452-A AS DEVELOPER; HIGH SENSITIVITY, LOW BACKGROUND BLUSH DURING STORAGE, RESISTANCE TO HEAT, MOISTURE, PLASTICIZER SANKO HAIHATSU KAGAKU KENKYUSHO (JP) 1998-01-06 US disclosed
EP-0791578-A2 Sulfonyl compound and thermalsensitive recording medium using the same Sanko Kaihatsu Kagaku Kenkyusho (JP) 1997-08-27 EP disclosed
EP-0706997-A1 Sulfonyl compound and thermal-sensitive recording medium using the same Sanko Kaihatsu Kagaku Kenkyusho (JP) 1996-04-17 EP disclosed