SCHEMBL8529019

SCHEMBL8529019

CCc1cc(O)c(S(=O)(=O)c2ccc(Cl)cc2)cc1S(=O)(=O)c1ccccc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 2/20 0.52
GAA P10253 2/20 0.48
GFER P55789 1/20 0.48
KIF18A Q8NI77 1/20 0.45
MEN1 O00255 3/20 0.42
KMT2A Q03164 3/20 0.42
KDM4E B2RXH2 2/20 0.42
HSP90AA1 P07900 2/20 0.42
HPGD P15428 1/20 0.42
HTT P42858 1/20 0.42
ATM Q13315 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
HSD11B1 P28845 2/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
LMNA P02545 1/20 0.41
CNR2 P34972 2/20 0.41
ALDH1A1 P00352 2/20 0.41
MAPK1 P28482 2/20 0.41
CYP3A4 P08684 1/20 0.41
PTGDR2 Q9Y5Y4 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8530237 1.00 POLB (0.52) POLBGAAGFERKIF18AMEN1
SCHEMBL8046743 0.91 POLB (0.56) POLBGAAGFERMEN1KMT2A
SCHEMBL8059447 0.87 L3MBTL1 (0.54) POLBGAAGFERMEN1KMT2A
SCHEMBL8046878 0.87 L3MBTL1 (0.54) POLBGAAGFERMEN1KMT2A
SCHEMBL8064276 0.86 POLB (0.48) POLBGAAGFERMEN1KMT2A
SCHEMBL8059300 0.86 POLB (0.48) POLBGAAGFERMEN1KMT2A
SCHEMBL10786726 0.84 POLB (0.53) POLBGAAGFERMEN1KMT2A
SCHEMBL8526579 0.83 POLB (0.55) POLBGAAGFERKIF18AMEN1
SCHEMBL8057488 0.83 POLB (0.55) POLBGAAGFERKIF18AMEN1
SCHEMBL8059394 0.81 L3MBTL1 (0.49) POLBGAAMEN1KMT2AKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0706997-B1 Sulfonyl compound and thermal-sensitive recording medium using the same SANKO KAIHATSU KAGAKU KENK (JP) 1998-03-11 EP disclosed
US-5705452-A AS DEVELOPER; HIGH SENSITIVITY, LOW BACKGROUND BLUSH DURING STORAGE, RESISTANCE TO HEAT, MOISTURE, PLASTICIZER SANKO HAIHATSU KAGAKU KENKYUSHO (JP) 1998-01-06 US disclosed
EP-0706997-A1 Sulfonyl compound and thermal-sensitive recording medium using the same Sanko Kaihatsu Kagaku Kenkyusho (JP) 1996-04-17 EP disclosed