SCHEMBL8062013

SCHEMBL8062013

Cc1ccc(S(=O)(=O)c2cc(S(=O)(=O)c3ccccc3)c(C)cc2O)cc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 1/20 0.58
MEN1 O00255 4/20 0.53
KMT2A Q03164 4/20 0.53
GAA P10253 6/20 0.53
POLB P06746 3/20 0.53
GFER P55789 1/20 0.53
ALDH1A1 P00352 6/20 0.49
HTT P42858 2/20 0.49
MAPT P10636 2/20 0.49
USP2 O75604 1/20 0.49
SMN1; SMN2 Q16637 3/20 0.45
RAPGEF4 Q8WZA2 1/20 0.45
COMT P21964 1/20 0.45
PKM P14618 1/20 0.44
PABPC1 P11940 1/20 0.44
ATM Q13315 1/20 0.44
ERAP1 Q9NZ08 1/20 0.44
KDM4E B2RXH2 2/20 0.43
NPSR1 Q6W5P4 1/20 0.43
RXFP1 Q9HBX9 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8062020 1.00 L3MBTL1 (0.58) L3MBTL1MEN1KMT2AGAAPOLB
SCHEMBL930983 0.94 POLB (0.59) L3MBTL1MEN1KMT2AGAAPOLB
SCHEMBL8062026 0.94 GAA (0.54) L3MBTL1MEN1KMT2AGAAPOLB
SCHEMBL8064321 0.88 KMT2A (0.51) L3MBTL1MEN1KMT2AGAAPOLB
SCHEMBL8526579 0.88 POLB (0.55) L3MBTL1MEN1KMT2AGAAPOLB
SCHEMBL8057488 0.88 POLB (0.55) L3MBTL1MEN1KMT2AGAAPOLB
SCHEMBL8047014 0.88 KMT2A (0.51) L3MBTL1MEN1KMT2AGAAPOLB
SCHEMBL8527509 0.86 GAA (0.51) L3MBTL1MEN1KMT2AGAAPOLB
SCHEMBL9645068 0.85 GAA (0.54) L3MBTL1MEN1KMT2AGAAPOLB
SCHEMBL10788994 0.85 POLB (0.56) L3MBTL1MEN1KMT2AGAAPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6040470-A DERIVATIVES OF 1-ORGANOETHER,-ESTER OR SULFONE-2,4-BIS-PHENYLSULFONYL)BENZENE IN AN AQUEOUS DEVELOPER SLURRY TO PREVENT DETERIORATION OF DISPERSION DUE TO HYDRATION; HIGHLY SENSITIVE; LESS SURFACE BLUSHING; STORAGE STABILITY OF IMAGE SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 2000-03-21 US disclosed
EP-0791578-B1 Sulfonyl compound and thermalsensitive recording medium using the same SANKO KAIHATSU KAGAKU KENK (JP) 1999-11-10 EP disclosed
US-5840652-A HIGH SENSITIVITY, STORAGE STABILITY SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 1998-11-24 US disclosed
EP-0706997-B1 Sulfonyl compound and thermal-sensitive recording medium using the same SANKO KAIHATSU KAGAKU KENK (JP) 1998-03-11 EP disclosed
US-5705452-A AS DEVELOPER; HIGH SENSITIVITY, LOW BACKGROUND BLUSH DURING STORAGE, RESISTANCE TO HEAT, MOISTURE, PLASTICIZER SANKO HAIHATSU KAGAKU KENKYUSHO (JP) 1998-01-06 US disclosed
EP-0791578-A2 Sulfonyl compound and thermalsensitive recording medium using the same Sanko Kaihatsu Kagaku Kenkyusho (JP) 1997-08-27 EP disclosed
EP-0706997-A1 Sulfonyl compound and thermal-sensitive recording medium using the same Sanko Kaihatsu Kagaku Kenkyusho (JP) 1996-04-17 EP disclosed