SCHEMBL8050867

SCHEMBL8050867

CC(C)COc1cccc(CO)c1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.49
SMN1; SMN2 Q16637 1/20 0.49
FAAH O00519 1/20 0.46
MAPK1 P28482 1/20 0.46
GPBAR1 Q8TDU6 1/20 0.46
CYSLTR1 Q9Y271 1/20 0.46
NR1H4 Q96RI1 2/20 0.45
MEN1 O00255 1/20 0.44
MAPT P10636 1/20 0.44
ALOX12 P18054 1/20 0.44
KMT2A Q03164 1/20 0.44
SIRT2 Q8IXJ6 1/20 0.44
CYP4F2 P78329 1/20 0.44
CYP4A11 Q02928 1/20 0.44
TRIM24 O15164 1/20 0.43
KDR P35968 1/20 0.43
LMNA P02545 1/20 0.43
HIF1A Q16665 1/20 0.42
TAAR1 Q96RJ0 2/20 0.42
KAT6A Q92794 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18175512 0.90 TSHR (0.47) TSHRSMN1; SMN2FAAHMAPK1GPBAR1
SCHEMBL8048495 0.86 CYP4F2 (0.61) TSHRFAAHMAPK1NR1H4MEN1
SCHEMBL16902900 0.85 TSHR (0.49) TSHRSMN1; SMN2MAPK1GPBAR1CYSLTR1
SCHEMBL322457 0.84 KDM4E (0.50) TSHRSMN1; SMN2FAAHMAPK1NR1H4
SCHEMBL320945 0.84 TAAR1 (0.51) TSHRFAAHMAPK1NR1H4MEN1
SCHEMBL2967940 0.82 TRIM24 (0.55) TSHRSMN1; SMN2MAPK1NR1H4MAPT
SCHEMBL31538932 0.82 MAOB (0.49) FAAHNR1H4MEN1MAPTALOX12
SCHEMBL6419825 0.82 FAAH (0.49) TSHRFAAHMAPK1NR1H4MEN1
SCHEMBL20825574 0.82 MAOB (0.49) FAAHNR1H4MEN1MAPTALOX12
SCHEMBL272030 0.82 TRIM24 (0.43) TSHRFAAHMAPK1NR1H4MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6106999-A SENSITIVITY TO GENERAL-PURPOSE VISIBLE LIGHT LASER, SO THAT HIGH-SPEED SCANNING EXPOSURE IS POSSIBLE BY LASER, AND EXTREMELY FINE HIGH RESOLUTION CAN BE OBTAINED; CAN BE USED FOR COATING OR PRINTING UNDER SAFELIGHT IRRADIATING CONDITIONS MITSUI CHEMICALS (JP) 2000-08-22 US disclosed