SCHEMBL8048495

SCHEMBL8048495

CC(C)COc1cccc(CCO)c1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP4F2 P78329 2/20 0.61
CYP4A11 Q02928 2/20 0.61
FAAH O00519 1/20 0.44
TSHR P16473 1/20 0.44
MAPK1 P28482 1/20 0.44
NR1H4 Q96RI1 1/20 0.43
FOS P01100 1/20 0.42
JUN P05412 1/20 0.42
MEN1 O00255 1/20 0.42
MAPT P10636 1/20 0.42
ALOX12 P18054 1/20 0.42
KMT2A Q03164 1/20 0.42
SIRT2 Q8IXJ6 1/20 0.42
TRIM24 O15164 1/20 0.42
PPARG P37231 1/20 0.41
PPARA Q07869 1/20 0.41
TAAR1 Q96RJ0 2/20 0.41
LMNA P02545 1/20 0.41
AOC3 Q16853 1/20 0.41
HIF1A Q16665 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8050867 0.86 TSHR (0.49) CYP4F2CYP4A11FAAHTSHRMAPK1
SCHEMBL327462 0.85 PPARA (0.46) CYP4F2CYP4A11FAAHNR1H4TRIM24
SCHEMBL11806920 0.83 FAAH (0.42) CYP4F2CYP4A11FAAHNR1H4FOS
SCHEMBL7989440 0.83 TAAR1 (0.62) SIRT2TAAR1AOC3
SCHEMBL8048492 0.83 NR1H4 (0.46) CYP4F2CYP4A11FAAHNR1H4FOS
SCHEMBL1206751 0.81 FOS (0.59) FAAHNR1H4FOSJUNPPARG
SCHEMBL2141621 0.81 CYP4F2 (0.55) CYP4F2CYP4A11TSHRMAPK1PPARG
SCHEMBL8045887 0.81 CYP4F2 (0.67) CYP4F2CYP4A11PPARGPPARATAAR1
SCHEMBL322457 0.81 KDM4E (0.50) FAAHTSHRMAPK1NR1H4MEN1
SCHEMBL320945 0.81 TAAR1 (0.51) FAAHTSHRMAPK1NR1H4MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6106999-A SENSITIVITY TO GENERAL-PURPOSE VISIBLE LIGHT LASER, SO THAT HIGH-SPEED SCANNING EXPOSURE IS POSSIBLE BY LASER, AND EXTREMELY FINE HIGH RESOLUTION CAN BE OBTAINED; CAN BE USED FOR COATING OR PRINTING UNDER SAFELIGHT IRRADIATING CONDITIONS MITSUI CHEMICALS (JP) 2000-08-22 US disclosed