⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2126599 | 0.73 | SLC6A4 (0.35) | — | |
| SCHEMBL8054299 | 0.71 | — | — | |
| SCHEMBL8883096 | 0.67 | — | — | |
| SCHEMBL5088721 | 0.64 | MAPT (0.31) | — | |
| SCHEMBL11415287 | 0.62 | — | — | |
| SCHEMBL1206900 | 0.62 | GRM2 (0.30) | — | |
| SCHEMBL11387548 | 0.61 | APLNR (0.31) | — | |
| SCHEMBL9659633 | 0.60 | GRM2 (0.31) | — | |
| SCHEMBL1206903 | 0.60 | CYP2D6 (0.36) | — | |
| SCHEMBL3586760 | 0.59 | GRM2 (0.47) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6103450-A | Photosensitive polymer, dissolution inhibitor and chemically amplified photoresist composition containing the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2000-08-15 | — | — | US | disclosed |