SCHEMBL8053597

SCHEMBL8053597

CC(C)Oc1ccccc1CC[O]

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IRAK4 Q9NWZ3 1/20 0.44
FFAR4 Q5NUL3 2/20 0.43
TAS1R3 Q7RTX0 1/20 0.43
TAS1R1 Q7RTX1 1/20 0.43
ALDH1A1 P00352 2/20 0.42
ACHE P22303 1/20 0.42
SLC6A2 P23975 1/20 0.41
SLC6A4 P31645 1/20 0.41
KCNH2 Q12809 1/20 0.41
NPSR1 Q6W5P4 2/20 0.41
USP2 O75604 1/20 0.41
HPGD P15428 1/20 0.41
TSHR P16473 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
TAAR1 Q96RJ0 1/20 0.40
KDM4E B2RXH2 2/20 0.40
LMNA P02545 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
TP53 P04637 1/20 0.39
MAPT P10636 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2097558 0.84 IRAK4 (0.47) IRAK4FFAR4TAS1R3TAS1R1ALDH1A1
SCHEMBL12844604 0.82 ADRA2A (0.54) IRAK4FFAR4TAS1R3TAS1R1ALDH1A1
SCHEMBL5412735 0.82 ADRA2A (0.51) IRAK4FFAR4TAS1R3TAS1R1ALDH1A1
SCHEMBL3842137 0.81 TAAR1 (0.63) IRAK4SLC6A2SLC6A4KCNH2TAAR1
SCHEMBL11099859 0.81 SLC6A2 (0.41) IRAK4FFAR4TAS1R3TAS1R1ALDH1A1
SCHEMBL14130989 0.81 ADRA2A (0.42) IRAK4FFAR4TAS1R3TAS1R1ALDH1A1
SCHEMBL8053601 0.81 IRAK4 (0.44) IRAK4FFAR4TAS1R3TAS1R1ALDH1A1
SCHEMBL7176135 0.80 IRAK4 (0.41) IRAK4FFAR4TAS1R3TAS1R1ALDH1A1
SCHEMBL27678662 0.79 HTR1A (0.44) IRAK4FFAR4TAS1R3TAS1R1SLC6A2
SCHEMBL1404966 0.79 ALDH1A1 (0.51) IRAK4FFAR4TAS1R3TAS1R1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6106999-A SENSITIVITY TO GENERAL-PURPOSE VISIBLE LIGHT LASER, SO THAT HIGH-SPEED SCANNING EXPOSURE IS POSSIBLE BY LASER, AND EXTREMELY FINE HIGH RESOLUTION CAN BE OBTAINED; CAN BE USED FOR COATING OR PRINTING UNDER SAFELIGHT IRRADIATING CONDITIONS MITSUI CHEMICALS (JP) 2000-08-22 US disclosed