Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1621552 | 0.78 | ALDH1A1 (0.42) | ALDH1A1TSHR | |
| SCHEMBL16232093 | 0.78 | — | — | |
| SCHEMBL16407782 | 0.77 | ALDH1A1 (0.32) | ALDH1A1 | |
| SCHEMBL23199767 | 0.75 | CA1 (0.32) | — | |
| SCHEMBL16842554 | 0.71 | CA2 (0.38) | CA2 | |
| SCHEMBL16479323 | 0.71 | DGAT1 (0.41) | CA2ALDH1A1TSHR | |
| SCHEMBL14140178 | 0.69 | — | — | |
| SCHEMBL3171358 | 0.67 | — | — | |
| SCHEMBL514835 | 0.65 | — | — | |
| SCHEMBL28742558 | 0.65 | ALDH1A1 (0.42) | ALDH1A1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0749044-B1 | Positive-working photoresist composition | TOKYO OHKA KOGYO CO LTD (JP) | 2000-09-06 | — | — | EP | disclosed |
| EP-0749046-B1 | Positive-working photoresist composition | TOKYO OHKA KOGYO CO LTD (JP) | 2000-05-10 | — | — | EP | disclosed |
| US-5856058-A | HALATION INHIBITOR WHICH IS AN ESTERIFICATION PRODUCT BETWEEN A SPECIFIED PHENOLIC COMPOUND AND A NAPHTHOQUINONE-1,2-DIAZIDE SULFONIC ACID. | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-01-05 | — | — | US | disclosed |
| US-5770343-A | Positive-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-06-23 | — | — | US | disclosed |
| EP-0749046-A1 | Positive-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-12-18 | — | — | EP | disclosed |
| EP-0749044-A2 | Positive-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-12-18 | — | — | EP | disclosed |