Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | CTSS | P25774 | 1/20 | 0.32 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.31 |
| ▸ | CXCR2 | P25025 | 1/20 | 0.31 |
| ▸ | CNR1 | P21554 | 1/20 | 0.31 |
| ▸ | CNR2 | P34972 | 1/20 | 0.31 |
| ▸ | COMT | P21964 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3181033 | 0.83 | CXCR2 (0.38) | CXCR2COMT | |
| SCHEMBL8041843 | 0.78 | COMT (0.35) | COMT | |
| SCHEMBL3174665 | 0.77 | NFE2L2 (0.34) | — | |
| SCHEMBL17435204 | 0.76 | DDR1 (0.31) | COMT | |
| SCHEMBL3175062 | 0.75 | COMT (0.36) | CTSSCXCR2COMT | |
| SCHEMBL28166430 | 0.72 | MEN1 (0.51) | MEN1KMT2ACTSS | |
| SCHEMBL3689443 | 0.68 | TP53 (0.37) | MEN1KMT2AEPHX2CNR1COMT | |
| SCHEMBL5882031 | 0.68 | COMT (0.38) | MEN1KMT2AEPHX2CNR1COMT | |
| SCHEMBL27618671 | 0.67 | PTGS2 (0.40) | — | |
| SCHEMBL30137800 | 0.67 | KMT2A (0.40) | MEN1KMT2ACTSS |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115480447-A | Negative photosensitive resin composition | DIC株式会社 | 2022-12-16 | — | — | CN | disclosed |
| CN-113348188-A | Phenolic hydroxyl group-containing resin, photosensitive composition, resist film, curable composition, and cured product | DIC株式会社 | 2021-09-03 | — | — | CN | disclosed |
| CN-108368214-B | Novolac resin and resist film | DIC株式会社 | 2021-03-23 | — | — | CN | disclosed |
| CN-108368213-B | Novolac resin and resist film | DIC株式会社 | 2020-12-18 | — | — | CN | disclosed |
| CN-110959138-A | Resist material | DIC株式会社 | 2020-04-03 | — | — | CN | disclosed |
| US-6090518-A | HAVING HIGH RESOLUTION, WHICH IS USEFUL FOR A HALFMICRONLITHOGRAPHY EMPLOYING A RADIATION | MITSUBISHI CHEMICAL CORPORATION (JP) | 2000-07-18 | — | — | US | disclosed |