SCHEMBL3174665

SCHEMBL3174665

COc1cccc(S(=O)(=O)C=[N+]=[N-])c1S(=O)(=O)C1CCCC1

nearest known ligand 0.34

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
NFE2L2 Q16236 4/20 0.34
CHRM4 P08173 1/20 0.32
HTR6 P50406 1/20 0.32
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
TXNRD1 Q16881 1/20 0.32
KCNH2 Q12809 1/20 0.32
APLNR P35414 2/20 0.32
SMN1; SMN2 Q16637 2/20 0.31
ALDH1A1 P00352 2/20 0.31
MCOLN3 Q8TDD5 1/20 0.31
AKR1C3 P42330 1/20 0.31
QRFPR Q96P65 1/20 0.31
NPC1 O15118 2/20 0.31
RAB9A P51151 2/20 0.31
KDM4E B2RXH2 1/20 0.31
GAA P10253 1/20 0.31
GFER P55789 1/20 0.31
MAPT P10636 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3181033 0.81 CXCR2 (0.38) NFE2L2
SCHEMBL8059970 0.77 MEN1 (0.33)
SCHEMBL8041843 0.76 COMT (0.35) CA1CA2SMN1; SMN2ALDH1A1MAPT
SCHEMBL3175062 0.76 COMT (0.36) CA1CA2TXNRD1ALDH1A1
SCHEMBL28047937 0.75 NFE2L2 (0.54) NFE2L2HTR6CA1CA2KCNH2
SCHEMBL17435204 0.72 DDR1 (0.31)
SCHEMBL16502908 0.71 HTR6 (0.49) NFE2L2CHRM4HTR6SMN1; SMN2ALDH1A1
SCHEMBL28091050 0.70 HTR6 (0.50) NFE2L2CHRM4HTR6CA1CA2
SCHEMBL3689443 0.68 TP53 (0.37) CA1CA2SMN1; SMN2ALDH1A1MCOLN3
SCHEMBL10797346 0.66 CXCR2 (0.44) APLNR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118011733-A Positive photosensitive resin composition, resist film, resist underlayer film, and resist permanent film DIC株式会社 2024-05-10 CN disclosed
CN-113348188-B Phenolic hydroxyl group-containing resin, photosensitive composition, resist film, curable composition, and cured product DIC株式会社 2024-05-10 CN disclosed
CN-117075428-A Negative photosensitive resin composition DIC株式会社 2023-11-17 CN disclosed
CN-110959138-B Resist material DIC株式会社 2023-06-30 CN disclosed
CN-115480447-A Negative photosensitive resin composition DIC株式会社 2022-12-16 CN disclosed
CN-113348188-A Phenolic hydroxyl group-containing resin, photosensitive composition, resist film, curable composition, and cured product DIC株式会社 2021-09-03 CN disclosed
CN-108368214-B Novolac resin and resist film DIC株式会社 2021-03-23 CN disclosed
CN-108368213-B Novolac resin and resist film DIC株式会社 2020-12-18 CN disclosed
CN-110959138-A Resist material DIC株式会社 2020-04-03 CN disclosed
US-7649118-B2 Process for preparing fluorine-containing norbornene derivative DAIKIN INDUSTRIES, LTD. (JP) 2010-01-19 US disclosed
US-20070129576-A1 Process for preparing fluorine-containing norbornene derivative DAIKIN INDUSTRIES, LTD. 2007-06-07 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070129576-A1 Process for preparing fluorine-containing norbornene derivative ADH1A, FLNA, FFAR2 NFE2L2 1981/4885CHRM4 1509/4885HTR6 3766/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.