SCHEMBL8057488

SCHEMBL8057488

Cc1cc(O)c(S(=O)(=O)c2ccc(Cl)cc2)cc1S(=O)(=O)c1ccccc1

nearest known ligand 0.55

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
POLB P06746 5/20 0.55
MEN1 O00255 3/20 0.51
KMT2A Q03164 3/20 0.51
GAA P10253 5/20 0.50
KIF18A Q8NI77 1/20 0.50
GFER P55789 1/20 0.50
L3MBTL1 Q9Y468 1/20 0.46
SMN1; SMN2 Q16637 3/20 0.45
TP53 P04637 2/20 0.45
MAPT P10636 2/20 0.45
ALDH1A1 P00352 4/20 0.44
HPGD P15428 2/20 0.44
KDM4E B2RXH2 1/20 0.44
CYP2C9 P11712 1/20 0.44
CYP2C19 P33261 1/20 0.44
CYP3A4 P08684 1/20 0.43
MAPK1 P28482 1/20 0.43
CNR2 P34972 1/20 0.42
PKM P14618 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8526579 1.00 POLB (0.55) POLBMEN1KMT2AGAAKIF18A
SCHEMBL930983 0.91 POLB (0.59) POLBMEN1KMT2AGAAGFER
SCHEMBL8062020 0.88 L3MBTL1 (0.58) POLBMEN1KMT2AGAAGFER
SCHEMBL8062013 0.88 L3MBTL1 (0.58) POLBMEN1KMT2AGAAGFER
SCHEMBL10785803 0.86 POLB (0.58) POLBMEN1KMT2AGAASMN1; SMN2
SCHEMBL8064321 0.85 KMT2A (0.51) POLBMEN1KMT2AGAAGFER
SCHEMBL8047014 0.85 KMT2A (0.51) POLBMEN1KMT2AGAAGFER
SCHEMBL8527509 0.84 GAA (0.51) POLBMEN1KMT2AGAAGFER
SCHEMBL8529019 0.83 POLB (0.52) POLBMEN1KMT2AGAAKIF18A
SCHEMBL8530237 0.83 POLB (0.52) POLBMEN1KMT2AGAAKIF18A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6040470-A DERIVATIVES OF 1-ORGANOETHER,-ESTER OR SULFONE-2,4-BIS-PHENYLSULFONYL)BENZENE IN AN AQUEOUS DEVELOPER SLURRY TO PREVENT DETERIORATION OF DISPERSION DUE TO HYDRATION; HIGHLY SENSITIVE; LESS SURFACE BLUSHING; STORAGE STABILITY OF IMAGE SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 2000-03-21 US disclosed
EP-0791578-B1 Sulfonyl compound and thermalsensitive recording medium using the same SANKO KAIHATSU KAGAKU KENK (JP) 1999-11-10 EP disclosed
US-5840652-A HIGH SENSITIVITY, STORAGE STABILITY SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 1998-11-24 US disclosed
EP-0706997-B1 Sulfonyl compound and thermal-sensitive recording medium using the same SANKO KAIHATSU KAGAKU KENK (JP) 1998-03-11 EP disclosed
US-5705452-A AS DEVELOPER; HIGH SENSITIVITY, LOW BACKGROUND BLUSH DURING STORAGE, RESISTANCE TO HEAT, MOISTURE, PLASTICIZER SANKO HAIHATSU KAGAKU KENKYUSHO (JP) 1998-01-06 US disclosed
EP-0791578-A2 Sulfonyl compound and thermalsensitive recording medium using the same Sanko Kaihatsu Kagaku Kenkyusho (JP) 1997-08-27 EP disclosed
EP-0706997-A1 Sulfonyl compound and thermal-sensitive recording medium using the same Sanko Kaihatsu Kagaku Kenkyusho (JP) 1996-04-17 EP disclosed