SCHEMBL8064321

SCHEMBL8064321

Cc1cc(O)c(S(=O)(=O)c2ccccc2)cc1S(=O)(=O)c1ccc(Br)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 5/20 0.51
MEN1 O00255 4/20 0.51
POLB P06746 3/20 0.50
GAA P10253 3/20 0.50
GFER P55789 1/20 0.50
L3MBTL1 Q9Y468 1/20 0.46
SMN1; SMN2 Q16637 3/20 0.45
MAPT P10636 2/20 0.45
TP53 P04637 1/20 0.45
TDP1 Q9NUW8 1/20 0.45
ALDH1A1 P00352 3/20 0.43
PKM P14618 1/20 0.42
PABPC1 P11940 1/20 0.42
ATM Q13315 1/20 0.42
ERAP1 Q9NZ08 1/20 0.42
CYTH2 Q99418 1/20 0.40
HSD17B2 P37059 1/20 0.40
RXRA P19793 1/20 0.39
RXRB P28702 1/20 0.39
RXRG P48443 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8047014 1.00 KMT2A (0.51) KMT2AMEN1POLBGAAGFER
SCHEMBL930983 0.91 POLB (0.59) KMT2AMEN1POLBGAAGFER
SCHEMBL8062013 0.88 L3MBTL1 (0.58) KMT2AMEN1POLBGAAGFER
SCHEMBL8062020 0.88 L3MBTL1 (0.58) KMT2AMEN1POLBGAAGFER
SCHEMBL10783820 0.86 MAPT (0.50) KMT2AMEN1POLBGAAL3MBTL1
SCHEMBL8526579 0.85 POLB (0.55) KMT2AMEN1POLBGAAGFER
SCHEMBL8057488 0.85 POLB (0.55) KMT2AMEN1POLBGAAGFER
SCHEMBL8527509 0.84 GAA (0.51) KMT2AMEN1POLBGAAGFER
SCHEMBL8064276 0.83 POLB (0.48) KMT2AMEN1POLBGAAGFER
SCHEMBL8059300 0.83 POLB (0.48) KMT2AMEN1POLBGAAGFER

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6040470-A DERIVATIVES OF 1-ORGANOETHER,-ESTER OR SULFONE-2,4-BIS-PHENYLSULFONYL)BENZENE IN AN AQUEOUS DEVELOPER SLURRY TO PREVENT DETERIORATION OF DISPERSION DUE TO HYDRATION; HIGHLY SENSITIVE; LESS SURFACE BLUSHING; STORAGE STABILITY OF IMAGE SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 2000-03-21 US disclosed
EP-0791578-B1 Sulfonyl compound and thermalsensitive recording medium using the same SANKO KAIHATSU KAGAKU KENK (JP) 1999-11-10 EP disclosed
US-5840652-A HIGH SENSITIVITY, STORAGE STABILITY SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 1998-11-24 US disclosed
EP-0706997-B1 Sulfonyl compound and thermal-sensitive recording medium using the same SANKO KAIHATSU KAGAKU KENK (JP) 1998-03-11 EP disclosed
US-5705452-A AS DEVELOPER; HIGH SENSITIVITY, LOW BACKGROUND BLUSH DURING STORAGE, RESISTANCE TO HEAT, MOISTURE, PLASTICIZER SANKO HAIHATSU KAGAKU KENKYUSHO (JP) 1998-01-06 US disclosed
EP-0791578-A2 Sulfonyl compound and thermalsensitive recording medium using the same Sanko Kaihatsu Kagaku Kenkyusho (JP) 1997-08-27 EP disclosed
EP-0706997-A1 Sulfonyl compound and thermal-sensitive recording medium using the same Sanko Kaihatsu Kagaku Kenkyusho (JP) 1996-04-17 EP disclosed