SCHEMBL806370

SCHEMBL806370

C=CC(=O)CCCO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9575278 0.92
SCHEMBL5935197 0.90 GPR84 (0.50)
SCHEMBL11666292 0.90 GPR84 (0.50)
SCHEMBL1988202 0.85 ALDH1A1 (0.50)
SCHEMBL6557587 0.85 ALDH1A1 (0.50)
SCHEMBL30731650 0.84 GPR84 (0.44)
SCHEMBL23631357 0.82 TSHR (0.48)
SCHEMBL739150 0.82
SCHEMBL22492168 0.82 TSHR (0.48)
SCHEMBL2691938 0.82 TSHR (0.48)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11735737-B2 Binder for electricity storage devices improving dispersibility of conductive assistant FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2023-08-22 US disclosed
US-11667564-B2 Method of manufacturing an etched glass article AGFA-GEVAERT NV (BE) 2023-06-06 US disclosed
US-20210017316-A1 Hydrogels Based on Vinyl-Caprolactam CONSEJO SUPERIOR DE INVESTIGACIONES CIENTÍFICAS (CSIC) (ES) 2021-01-21 US disclosed
US-10039193-B2 Etch-resistant inkjet inks for manufacturing conductive patterns AGFA-GEVAERT (BE) 2018-07-31 US disclosed
US-20180201713-A1 POLYMER, RESIN COMPOSITION, LIGHT CONTROL MATERIAL, OPTICAL WAVEGUIDE MATERIAL, ATHERMAL OPTICAL ELEMENT, COLOR DISPLAY ELEMENT, AND OPTICAL MATERIAL RICOH COMPANY, LTD. (JP) 2018-07-19 US disclosed
US-9938420-B2 Digital fabrication of metallic articles AGFA-GEVAERT (BE) 2018-04-10 US disclosed
US-20170313052-A1 METHOD FOR PREPARING A LITHOGRAPHIC PRINTING PLATE PRECURSOR AGFA OFFSET BV (BE) 2017-11-02 US disclosed
US-20170266353-A1 BIOADHESIVE COMPOUNDS AND METHODS OF SYNTHESIS AND USE DSM IP ASSETS BV (NL) 2017-09-21 US disclosed
US-20170226355-A1 DIGITAL FABRICATION OF METALLIC ARTICLES AGFA-GEVAERT (BE) 2017-08-10 US disclosed
US-20170218520-A1 METHODS OF MANUFACTURING EMBOSSING ELEMENTS AGFA GRAPHICS NV (BE) 2017-08-03 US disclosed
US-20070212556-A1 Curable materials containing siloxane HENKEL AG & CO. KGAA (DE) 2007-09-13 US disclosed
CN-1308487-C Rust inhibitor and rust inhibiting method using the same OTSUKA CHEMICAL CO LTD (JP) 2007-04-04 CN disclosed
CN-1650049-A Rust inhibitor and rust inhibiting method using the same OTSUKA CHEMICAL CO LTD (JP) 2005-08-03 CN disclosed
EP-0539655-A2 Blends of comb-shaped copolymers of a macromolecular monomer of polylactone with polymer (s) THE B.F. GOODRICH COMPANY (US) 1993-05-05 EP disclosed
US-5120790-A Combatible THE B. F. GOODRICH COMPANY (US) 1992-06-09 US disclosed
US-5061772-A EMULSION POLYMERIZATION OF ACRYLATED POLYLACTONE IN ETHYLENICALLY UNSATURATED COMONOMER THE B. F. GOODRICH COMPANY (US) 1991-10-29 US disclosed
US-4983689-A Using an oxonium salt cationic initiator at a low temperature; by-product inhibition; comb polymers; polyurethane coatings NOVEON IP HOLDINGS CORP., FORMERLY KNOWN AS PMD HOLDINGS CORP. 1991-01-08 US disclosed
EP-0196708-B1 PROCESS FOR THE PREPARATION OF 2-(HYDROXYALKYL)ACRYLIC COMPOUNDS STAMICARBON B.V. (NL) 1989-08-23 EP disclosed
US-4820858-A Process for the preparation of 2-(hydroxyalkyl)acrylic compounds STAMICARBON B.V. (NL) 1989-04-11 US disclosed
EP-0196708-A1 Process for the preparation of 2-(hydroxyalkyl)acrylic compounds STAMICARBON B.V. (NL) 1986-10-08 EP disclosed