SCHEMBL8064328

SCHEMBL8064328

O=S(=O)(c1ccc(Br)cc1)c1ccc(O)c(S(=O)(=O)c2ccc(Br)cc2)c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 3/20 0.53
GAA P10253 4/20 0.51
GFER P55789 1/20 0.51
ALDH1A1 P00352 1/20 0.50
PKM P14618 1/20 0.50
MAPT P10636 3/20 0.48
CA2 P00918 3/20 0.45
L3MBTL1 Q9Y468 1/20 0.43
SMN1; SMN2 Q16637 2/20 0.42
HSD17B2 P37059 1/20 0.41
CA12 O43570 2/20 0.41
CA9 Q16790 2/20 0.41
CA1 P00915 1/20 0.41
MMP1 P03956 1/20 0.41
MMP2 P08253 1/20 0.41
MMP9 P14780 1/20 0.41
MMP8 P22894 1/20 0.41
MMP13 P45452 1/20 0.41
WDR5 P61964 1/20 0.40
TP53 P04637 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8529690 1.00 POLB (0.53) POLBGAAGFERALDH1A1PKM
SCHEMBL8057512 0.93 GAA (0.63) POLBGAAGFERALDH1A1PKM
SCHEMBL8057506 0.93 GAA (0.63) POLBGAAGFERALDH1A1PKM
SCHEMBL7126365 0.85 POLB (0.66) POLBGAAGFERALDH1A1PKM
SCHEMBL660467 0.83 GAA (0.73) POLBGAAGFERALDH1A1PKM
SCHEMBL6534882 0.83 GAA (0.73) POLBGAAGFERALDH1A1PKM
SCHEMBL8530238 0.81 POLB (0.77) POLBGAAGFERALDH1A1PKM
SCHEMBL8431114 0.81 POLB (0.77) POLBGAAGFERALDH1A1PKM
SCHEMBL656872 0.81 L3MBTL1 (0.61) POLBGAAGFERALDH1A1PKM
SCHEMBL8527259 0.81 L3MBTL1 (0.61) POLBGAAGFERALDH1A1PKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6040470-A DERIVATIVES OF 1-ORGANOETHER,-ESTER OR SULFONE-2,4-BIS-PHENYLSULFONYL)BENZENE IN AN AQUEOUS DEVELOPER SLURRY TO PREVENT DETERIORATION OF DISPERSION DUE TO HYDRATION; HIGHLY SENSITIVE; LESS SURFACE BLUSHING; STORAGE STABILITY OF IMAGE SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 2000-03-21 US disclosed
EP-0791578-B1 Sulfonyl compound and thermalsensitive recording medium using the same SANKO KAIHATSU KAGAKU KENK (JP) 1999-11-10 EP disclosed
US-5840652-A HIGH SENSITIVITY, STORAGE STABILITY SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 1998-11-24 US disclosed
EP-0706997-B1 Sulfonyl compound and thermal-sensitive recording medium using the same SANKO KAIHATSU KAGAKU KENK (JP) 1998-03-11 EP disclosed
US-5705452-A AS DEVELOPER; HIGH SENSITIVITY, LOW BACKGROUND BLUSH DURING STORAGE, RESISTANCE TO HEAT, MOISTURE, PLASTICIZER SANKO HAIHATSU KAGAKU KENKYUSHO (JP) 1998-01-06 US disclosed
EP-0791578-A2 Sulfonyl compound and thermalsensitive recording medium using the same Sanko Kaihatsu Kagaku Kenkyusho (JP) 1997-08-27 EP disclosed
EP-0706997-A1 Sulfonyl compound and thermal-sensitive recording medium using the same Sanko Kaihatsu Kagaku Kenkyusho (JP) 1996-04-17 EP disclosed