SCHEMBL8527259

SCHEMBL8527259

Cc1ccc(S(=O)(=O)c2cc(S(=O)(=O)c3ccc(O)c(S(=O)(=O)c4ccc(C)cc4)c3)ccc2O)cc1

nearest known ligand 0.77

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 1/20 0.61
GAA P10253 6/20 0.59
ALDH1A1 P00352 3/20 0.58
PKM P14618 2/20 0.58
POLB P06746 2/20 0.53
GFER P55789 1/20 0.51
MAPT P10636 3/20 0.51
MEN1 O00255 2/20 0.51
KMT2A Q03164 2/20 0.51
USP2 O75604 1/20 0.51
HTT P42858 1/20 0.51
COMT P21964 2/20 0.50
RAPGEF4 Q8WZA2 1/20 0.47
CA2 P00918 3/20 0.46
CA12 O43570 1/20 0.45
CA1 P00915 1/20 0.45
CA3 P07451 1/20 0.45
CA6 P23280 1/20 0.45
CA5A P35218 1/20 0.45
CA7 P43166 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL656872 1.00 L3MBTL1 (0.61) L3MBTL1GAAALDH1A1PKMPOLB
SCHEMBL8047007 0.93 L3MBTL1 (0.68) L3MBTL1GAAALDH1A1PKMPOLB
SCHEMBL8057552 0.93 L3MBTL1 (0.68) L3MBTL1GAAALDH1A1PKMPOLB
SCHEMBL9001313 0.91 L3MBTL1 (0.63) L3MBTL1GAAALDH1A1PKMPOLB
SCHEMBL10489221 0.87 GAA (0.71) L3MBTL1GAAALDH1A1PKMPOLB
SCHEMBL7126365 0.85 POLB (0.66) L3MBTL1GAAALDH1A1PKMPOLB
SCHEMBL312194 0.85 GAA (0.64) L3MBTL1GAAALDH1A1PKMMAPT
SCHEMBL6322364 0.84 L3MBTL1 (0.57) L3MBTL1GAAALDH1A1PKMPOLB
SCHEMBL8768169 0.84 GAA (0.61) L3MBTL1GAAALDH1A1PKMPOLB
SCHEMBL8064234 0.84 ALDH1A1 (0.81) L3MBTL1GAAALDH1A1PKMPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0706997-B1 Sulfonyl compound and thermal-sensitive recording medium using the same SANKO KAIHATSU KAGAKU KENK (JP) 1998-03-11 EP disclosed
US-5705452-A AS DEVELOPER; HIGH SENSITIVITY, LOW BACKGROUND BLUSH DURING STORAGE, RESISTANCE TO HEAT, MOISTURE, PLASTICIZER SANKO HAIHATSU KAGAKU KENKYUSHO (JP) 1998-01-06 US disclosed
EP-0706997-A1 Sulfonyl compound and thermal-sensitive recording medium using the same Sanko Kaihatsu Kagaku Kenkyusho (JP) 1996-04-17 EP disclosed