SCHEMBL8067280

SCHEMBL8067280

C=CSC(O)c1ccccc1

nearest known ligand 0.41

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.39
ALDH1A1 P00352 1/20 0.39
CYP2C19 P33261 1/20 0.38
LMNA P02545 4/20 0.38
MAPK1 P28482 1/20 0.38
AOC3 Q16853 1/20 0.38
KDM4E B2RXH2 2/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
ADRA2A P08913 1/20 0.35
ADRA2C P18825 1/20 0.35
HIF1A Q16665 1/20 0.35
HPGD P15428 1/20 0.35
RIPK1 Q13546 1/20 0.35
CYP2D6 P10635 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27561623 0.77 CYP2D6 (0.44) TSHRLMNAMAPK1AOC3KDM4E
SCHEMBL3648024 0.72 ALDH1A1 (0.46) TSHRALDH1A1LMNAMAPK1AOC3
SCHEMBL9633963 0.70 TSHR (0.46) TSHRALDH1A1LMNAMAPK1AOC3
SCHEMBL96576 0.69 TSHR (0.43) TSHRALDH1A1CYP2C19LMNAMAPK1
SCHEMBL1268813 0.69 LMNA (0.46) TSHRALDH1A1CYP2C19LMNAMAPK1
SCHEMBL3893413 0.69 TSHR (0.43) TSHRALDH1A1CYP2C19LMNAMAPK1
Benzene SCHEMBL28196864 0.69 TSHR (0.43) TSHRALDH1A1CYP2C19LMNAMAPK1
SCHEMBL1719932 0.69 LMNA (0.42) TSHRALDH1A1LMNAMAPK1AOC3
SCHEMBL22519675 0.69 LMNA (0.46) TSHRALDH1A1CYP2C19LMNAMAPK1
SCHEMBL28306595 0.69 TSHR (0.43) TSHRALDH1A1CYP2C19LMNAMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1065525-C A process of producing a monomer for a highly hard transparent resin MITSUI TOATSU CHEMICALS (JP) 2001-05-09 CN disclosed
EP-0551867-B1 Laminated transparent plastic material and polymerizable monomer MITSUI CHEMICALS INC (JP) 2000-06-07 EP disclosed
CN-1029851-C Preparation of high-hardness transparent resin MITSUI TOATSU CHEMICALS (JP) 1995-09-27 CN disclosed
CN-1108667-A A process of producing a monomer for a highly hard transparent resin MITSUI TOATSU CHEMICALS (JP) 1995-09-20 CN disclosed
US-5451695-A Acrylic ester monomer with carbamate group, glazing for windows MITSUI TOATSU CHEMICALS, INC. (JP) 1995-09-19 US disclosed
CN-1104648-A A process of producing a glazing material comprising a highly hard transparent resin MITSUI TOATSU CHEMICALS (JP) 1995-07-05 CN disclosed
CN-1104649-A A process of producing an optical lens comprising a highly hard transparent resin MITSUI TOATSU CHEMICALS (JP) 1995-07-05 CN disclosed
EP-0345748-B1 Hard transparent resins and process for the production thereof MITSUI TOATSU CHEMICALS (JP) 1995-04-26 EP disclosed
US-5393607-A Glazing materials; hardness, impact strength, scratch resistance MITSUI TOATSU CHEMICLAS, INC. (JP) 1995-02-28 US disclosed
EP-0551867-A1 Laminated transparent plastic material and polymerizable monomer MITSUI TOATSU CHEMICALS, Inc. (JP) 1993-07-21 EP disclosed
US-5166285-A Polymers for optical lenses MITSUI TOATSU CHEMICALS, INC. (JP) 1992-11-24 US disclosed
US-5104953-A HARD TRANSPARENT RESINS AND PROCESS FOR THE PRODUCTION THEREOF MITSUI TOATSU CHEMICALS, INC. (JP) 1992-04-14 US disclosed
CN-1040365-A Preparation of high-hardness transparent resin MITSUI TOATSU CHEMICALS (JP) 1990-03-14 CN disclosed
EP-0345748-A2 Hard transparent resins and process for the production thereof MITSUI TOATSU CHEMICALS, Inc. (JP) 1989-12-13 EP disclosed