Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MMP8 | P22894 | 1/20 | 0.41 |
| ▸ | GRM1 | Q13255 | 1/20 | 0.34 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | ESR1 | P03372 | 1/20 | 0.30 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.30 |
| ▸ | KDR | P35968 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18560733 | 0.90 | MMP8 (0.41) | MMP8 | |
| SCHEMBL25007448 | 0.89 | ALDH1A1 (0.42) | MMP8HCAR2ALDH1A1LMNAESR1 | |
| SCHEMBL14421136 | 0.85 | MMP8 (0.38) | MMP8ALDH1A1TSHR | |
| SCHEMBL1867004 | 0.85 | GRM1 (0.35) | MMP8GRM1HCAR2ALDH1A1LMNA | |
| SCHEMBL17325884 | 0.84 | CHRM2 (0.38) | MMP8ALDH1A1LMNACHRM1TSHR | |
| SCHEMBL12608203 | 0.84 | MMP8 (0.37) | MMP8 | |
| SCHEMBL13344641 | 0.84 | MMP8 (0.37) | MMP8 | |
| SCHEMBL16883003 | 0.82 | MMP8 (0.36) | MMP8 | |
| SCHEMBL17325882 | 0.82 | CHRM2 (0.48) | ALDH1A1LMNACHRM1TSHR | |
| SCHEMBL18516835 | 0.81 | GRM1 (0.34) | MMP8GRM1HCAR2ALDH1A1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2012036315-A1 | METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2012-03-22 | — | — | WO | disclosed |
| EP-1972641-A2 | Resist composition and pattern-forming method using same | FUJIFILM Corporation (JP) | 2008-09-24 | — | — | EP | disclosed |