SCHEMBL13344641

SCHEMBL13344641

CC(C)CC(C)(C(=O)OCCF)C(C)C

nearest known ligand 0.37

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
MMP8 P22894 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18560733 0.89 MMP8 (0.41) MMP8
SCHEMBL14421136 0.87 MMP8 (0.38) MMP8
SCHEMBL12608203 0.86 MMP8 (0.37) MMP8
SCHEMBL807035 0.84 MMP8 (0.41) MMP8
SCHEMBL20998381 0.83 MMP8 (0.38) MMP8
SCHEMBL29332044 0.83 MMP8 (0.35) MMP8
SCHEMBL16313603 0.81 MMP8 (0.39) MMP8
SCHEMBL25608091 0.81 MMP8 (0.34) MMP8
SCHEMBL25007448 0.81 ALDH1A1 (0.42) MMP8
SCHEMBL14950972 0.81 LMNA (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2013069811-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2013-05-16 WO disclosed
WO-2010067905-A2 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2010-06-17 WO disclosed