Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.42 |
| ▸ | MEN1 | O00255 | 8/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 8/20 | 0.42 |
| ▸ | GAA | P10253 | 6/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 6/20 | 0.42 |
| ▸ | MAPT | P10636 | 6/20 | 0.42 |
| ▸ | NPC1 | O15118 | 4/20 | 0.42 |
| ▸ | NPSR1 | Q6W5P4 | 3/20 | 0.42 |
| ▸ | RAB9A | P51151 | 3/20 | 0.42 |
| ▸ | GRK6 | P43250 | 1/20 | 0.42 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.40 |
| ▸ | S100B | P04271 | 1/20 | 0.39 |
| ▸ | GFER | P55789 | 3/20 | 0.38 |
| ▸ | TP53 | P04637 | 2/20 | 0.38 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.38 |
| ▸ | CNR2 | P34972 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 3/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.38 |
| ▸ | HPGD | P15428 | 2/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8706694 | 0.89 | ALDH1A1 (0.41) | ALDH1A1MEN1KMT2AGAAL3MBTL1 | |
| SCHEMBL9803569 | 0.83 | ALDH1A1 (0.43) | ALDH1A1MEN1KMT2AGAAL3MBTL1 | |
| SCHEMBL11595157 | 0.83 | KIF11 (0.40) | ALDH1A1MEN1KMT2AGAAL3MBTL1 | |
| Bromide SCHEMBL8982805 | 0.81 | ALDH1A1 (0.42) | ALDH1A1MEN1KMT2AGAAL3MBTL1 | |
| SCHEMBL3897467 | 0.79 | ALDH1A1 (0.43) | ALDH1A1MEN1KMT2AGAAL3MBTL1 | |
| SCHEMBL82135 | 0.79 | MEN1 (0.52) | ALDH1A1MEN1KMT2AGAAL3MBTL1 | |
| SCHEMBL27589412 | 0.72 | HTR5A (0.35) | MEN1KMT2A | |
| SCHEMBL9659502 | 0.72 | MEN1 (0.47) | ALDH1A1MEN1KMT2AGAAL3MBTL1 | |
| SCHEMBL9803843 | 0.72 | ALDH1A1 (0.47) | ALDH1A1MEN1KMT2AGAAL3MBTL1 | |
| SCHEMBL3907143 | 0.72 | CHEK1 (0.50) | ALDH1A1MEN1KMT2AGAAMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8127675-B2 | Lithographic printing plate precursor and lithographic printing method | FUJIFILM CORPORATION (JP) | 2012-03-06 | — | — | US | disclosed |
| US-7662540-B2 | Support, photosensitive layer, protective film; photosensitive layer and protective film being formed in this order on support, wherein number of fish-eyes each having area of 2,000 mu m2 or more and maximum height measured from film surface of 1 mu m to 7 mu m residing in film is 50/m2-1,000/m2 | FUJIFILM CORPORATION (JP) | 2010-02-16 | — | — | US | disclosed |
| US-20100005989-A1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR AND LITHOGRAPHIC PRINTING METHOD | FUJIFILM CORPORATION | 2010-01-14 | — | — | US | disclosed |
| US-7556911-B2 | Titanocene based compound, photosensitive composition, photosensitive transfer sheet and pattern forming method | FUJIFILM CORPORATION (JP) | 2009-07-07 | — | — | US | disclosed |
| EP-1765592-B1 | METHOD FOR MAKING NEGATIVE-WORKING HEAT-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR | AGFA GRAPHICS NV (BE) | 2009-01-28 | — | — | EP | disclosed |
| US-20080311524-A1 | Method For Making Negative-Working Heat-Sensitive Lithographic Printing Plate Precursor | AGFA GRAPHICS N.V. (BE) | 2008-12-18 | — | — | US | disclosed |
| US-20080268374-A1 | Photosensitive Composition, Pattern Forming Material, Photosensitive Laminate, Pattern Forming Apparatus, and Pattern Forming Process | FUJIFILM CORPORATION (JP) | 2008-10-30 | — | — | US | disclosed |
| US-7402374-B2 | Method for colored image formation | FUJIFILM CORPORATION (JP) | 2008-07-22 | — | — | US | disclosed |
| US-20080118867-A1 | Pattern Forming Material, Pattern Forming Apparatus, And Pattern Forming Process | ASAHI KASEI E-MATERIALS CORPORATION (JP) | 2008-05-22 | — | — | US | disclosed |
| US-20080113302-A1 | Pattern Forming Process | FUJIFILM CORPORATION (JP) | 2008-05-15 | — | — | US | disclosed |
| US-20030232193-A1 | Dry film resist and printed circuit board producing method | FUJI PHOTO FILM CO., LTD. (JP) | 2003-12-18 | — | — | US | disclosed |
| US-5030548-A | Photoiniator system comprising a 4,4'-bis(dialkylamino) benzophenone, an aromatic ketone and lophine dimer; also present a halogen compound leuco and dye; lithography; printing plates; photoresists | FUJI PHOTO FILM CO., LTD. (JP) | 1991-07-09 | — | — | US | disclosed |
| US-4857438-A | Photochromic system and layers produced therewith | BASF AKTIENGESELLSCHAFT (DE) | 1989-08-15 | — | — | US | disclosed |
| US-4332884-A | USING A DIOXIME CHELATING AGENT | RICOH CO., LTD. (JP) | 1982-06-01 | — | — | US | disclosed |
| US-4315068-A | CONTAINING A COBALT-AMMINE COMPLEX AND A DIOXIME OR A BISIMIDAZOLIN-3-ONE CHELATING AGENT; STABILITY; COLOR DILMS | RICOH CO., LTD. (JP) | 1982-02-09 | — | — | US | disclosed |
| US-4306014-A | AMMONIA OR AMINES SUPPRESS THE COLOR-FORMING REACTION SYSTEM | RICOH CO., LTD. (JP) | 1981-12-15 | — | — | US | disclosed |
| US-4271251-A | LEUCO DYE, PHOTOOXIDIZER, 2,4-DIHYDROXY-BENZALDOXIME | FUJI PHOTO FILM CO., LTD. (JP) | 1981-06-02 | — | — | US | disclosed |
| US-4251619-A | Process for forming photo-polymeric image | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1981-02-17 | — | — | US | disclosed |
| US-4139390-A | Presensitized printing plate having a print-out image | EASTMAN KODAK COMPANY (US) | 1979-02-13 | — | — | US | disclosed |
| US-3933507-A | LIGHT INSENSITIVE SILVER SALT, POLYMETHINE SENSITIZER | AGFA-GEVAERT, A.G. (DT) | 1976-01-20 | — | — | US | disclosed |