SCHEMBL8089682

SCHEMBL8089682

COc1ccc(-c2nc(-c3ccccc3Cl)n(C3(c4ccccc4Cl)N=C(c4ccccc4)C(c4ccccc4)=N3)c2-c2ccccc2Cl)cc1OC

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 3/20 0.45
MEN1 O00255 4/20 0.42
KMT2A Q03164 4/20 0.42
ALDH1A1 P00352 4/20 0.42
TP53 P04637 2/20 0.42
TSHR P16473 2/20 0.42
NPC1 O15118 1/20 0.42
RAB9A P51151 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
PDE4A P27815 1/20 0.40
ACACA Q13085 1/20 0.38
KDM4E B2RXH2 3/20 0.36
HSD17B10 Q99714 2/20 0.36
YAP1 P46937 1/20 0.36
ADORA1 P30542 1/20 0.36
SLC10A2 Q12908 1/20 0.35
MGAM O43451 1/20 0.35
GAA P10253 1/20 0.35
SI P14410 1/20 0.35
MGAM2 Q2M2H8 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22710269 0.95 L3MBTL1 (0.43) L3MBTL1MEN1KMT2AALDH1A1TP53
SCHEMBL29895743 0.95 L3MBTL1 (0.43) L3MBTL1MEN1KMT2AALDH1A1TP53
SCHEMBL16355181 0.94 L3MBTL1 (0.43) L3MBTL1MEN1KMT2AALDH1A1TP53
SCHEMBL31734215 0.94 L3MBTL1 (0.43) L3MBTL1MEN1KMT2AALDH1A1TP53
SCHEMBL20464140 0.92 L3MBTL1 (0.44) L3MBTL1MEN1KMT2AALDH1A1TP53
SCHEMBL29895740 0.89 L3MBTL1 (0.43) L3MBTL1MEN1KMT2AALDH1A1TP53
SCHEMBL16365751 0.89 L3MBTL1 (0.43) L3MBTL1MEN1KMT2AALDH1A1TP53
SCHEMBL24924237 0.88 ERN1 (0.38) L3MBTL1MEN1KMT2AALDH1A1TP53
SCHEMBL25808949 0.88 PDCD1 (0.38) L3MBTL1MEN1KMT2AALDH1A1TP53
SCHEMBL25778191 0.88 ALDH1A1 (0.38) L3MBTL1MEN1KMT2AALDH1A1TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1062546-A1 PROCESS FOR THE CONTINUOUS LIQUID PROCESSING OF PHOTOSENSITIVE COMPOSITIONS HAVING REDUCED LEVELS OF RESIDUES E.I. DUPONT DE NEMOURS AND COMPANY (US) 2000-12-27 EP claimed
WO-1999046644-A1 PROCESS FOR THE CONTINUOUS LIQUID PROCESSING OF PHOTOSENSITIVE COMPOSITIONS HAVING REDUCED LEVELS OF RESIDUES E.I. DU PONT DE NEMOURS AND COMPANY (US) 1999-09-16 WO claimed
US-20210191264-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND ORGANIC EL DISPLAY AND MANUFACTURING METHOD THEREFOR TORAY INDUSTRIES, INC. (JP) 2021-06-24 US disclosed