SCHEMBL8096761

SCHEMBL8096761

C#C[Si](C)(C)Oc1ccc(Cl)cc1Cl

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
S1PR4 O95977 4/20 0.43
MAPK1 P28482 4/20 0.42
HPGD P15428 3/20 0.42
CYP3A4 P08684 2/20 0.42
TSHR P16473 2/20 0.42
NPC1 O15118 1/20 0.42
ALDH1A1 P00352 1/20 0.42
CYP1A2 P05177 1/20 0.42
CYP2D6 P10635 1/20 0.42
MAOA P21397 1/20 0.42
MAOB P27338 1/20 0.42
CYP2C19 P33261 1/20 0.42
THPO P40225 1/20 0.42
RAB9A P51151 1/20 0.42
HIF1A Q16665 1/20 0.42
HSD17B10 Q99714 1/20 0.42
MAPT P10636 2/20 0.41
STAT3 P40763 1/20 0.41
KDM4E B2RXH2 1/20 0.41
KMT2A Q03164 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8096564 0.79 NR1I2 (0.35) NPC1LMNANR1I2ADORA3SLC6A2
SCHEMBL8832653 0.79 LMNA (0.47) S1PR4MAPK1HPGDTSHRALDH1A1
SCHEMBL2989844 0.73 S1PR4 (0.42) S1PR4MAPK1HPGDNPC1CYP1A2
SCHEMBL9329848 0.71 HPGD (0.47) S1PR4MAPK1HPGDCYP3A4TSHR
SCHEMBL5604866 0.70 MAPK1 (0.50) S1PR4MAPK1HPGDCYP3A4TSHR
SCHEMBL17186968 0.68 HPGD (0.42) S1PR4MAPK1HPGDCYP3A4TSHR
SCHEMBL7030457 0.68 TTR (0.53) HPGDMAPTLMNANR1I2TTR
SCHEMBL9787779 0.68 TTR (0.52) HPGDCYP3A4TSHRHSD17B10MAPT
SCHEMBL196490 0.68 TTR (0.62) HPGDNPC1ALDH1A1RAB9AMAPT
SCHEMBL29687129 0.68 TTR (0.62) HPGDNPC1ALDH1A1RAB9AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0700951-B1 Polyorganosiloxane and process for producing the same SHOWA DENKO KK (JP) 2000-12-27 EP disclosed
US-5622784-A WATERPROOFING; MODIFIED SILICON DIOXIDE THIN FILM SEIKO EPSON CORPORATION (JP) 1997-04-22 US disclosed
EP-0700951-A1 Polyorganosiloxane and process for producing the same SHOWA DENKO KABUSHIKI KAISHA (JP) 1996-03-13 EP disclosed
US-5491203-A COMPRISES POLYSILSESQUIOXANE STRUCTURE; HAS METHYL GROUP AND A REACTIVE GROUP ON SIDE CHAINS; SUITABLE AS POLYMER MODIFIER; CROSSLINKING; COATINGS SHOWA DENKO K. K. (JP) 1996-02-13 US disclosed