SCHEMBL809990

SCHEMBL809990

BCCCCCC(c1cccc(F)c1)(c1cccc(F)c1)c1cccc(F)c1

nearest known ligand 0.39

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
KCNN4 O15554 4/20 0.39
KIF11 P52732 8/20 0.37
CYP3A4 P08684 1/20 0.37
CYP2D6 P10635 1/20 0.37
CYP2C9 P11712 1/20 0.37
CYP2C19 P33261 1/20 0.37
KCNH2 Q12809 1/20 0.37
TAAR1 Q96RJ0 2/20 0.34
MIF P14174 1/20 0.34
IDO1 P14902 2/20 0.33
AGXT P21549 2/20 0.33
CYP19A1 P11511 1/20 0.33
HDAC6 Q9UBN7 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4961255 0.93 KCNN4 (0.41) KCNN4KIF11CYP3A4CYP2D6CYP2C9
SCHEMBL4961742 0.82
SCHEMBL4957728 0.79 KIF11 (0.59) KIF11CYP3A4CYP2D6CYP2C9CYP2C19
SCHEMBL4960840 0.79 KIF11 (0.37) KIF11CYP3A4CYP2D6CYP2C9CYP2C19
Tetramethylammonium Ion SCHEMBL3362588 0.78 KIF11 (0.37) KCNN4KIF11CYP3A4CYP2D6CYP2C9
SCHEMBL810137 0.77 KIF11 (0.57) KIF11CYP3A4CYP2D6CYP2C9CYP2C19
SCHEMBL5143617 0.75 KCNN4 (0.36) KCNN4KIF11CYP3A4CYP2D6CYP2C9
Tetrylammonium SCHEMBL3361652 0.74 KIF11 (0.37) KCNN4KIF11CYP3A4CYP2D6CYP2C9
Tetramethylammonium Ion SCHEMBL3360720 0.73 KIF11 (0.39) KCNN4KIF11CYP3A4CYP2D6CYP2C9
SCHEMBL4961602 0.71 KIF11 (0.63) KIF11CYP3A4CYP2D6CYP2C9CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4043502-B1 PHOTOPOLYMERIZABLE HOE COMPOSITION XETOS AG (DE) 2023-10-04 EP claimed
EP-4043961-B1 2K SYSTEM XETOS AG (DE) 2023-08-16 EP claimed
EP-4043963-B1 IMPROVED BLEACHING XETOS AG (DE) 2023-07-05 EP claimed
EP-2218745-B1 Prepolymer-based polyurethane formulations for producing holographic films BAYER MATERIALSCIENCE AG (DE) 2011-11-23 EP claimed
EP-1943287-A2 MOLDING COMPOSITION AND METHOD, AND MOLDED ARTICLE General Electric Company (US) 2008-07-16 EP claimed
US-7378455-B2 A curable epoxy resin , two latent cationic curing catalyst, a free radical-producng cocatalyst and inorganic filler of about 70-95 weight % based on the total weight; catalyst allows the use of increased filler loadingsto reduce moisture absorption and thermal expansion; encapsulating solid state device GENERAL ELECTRIC COMPANY (US) 2008-05-27 US claimed
WO-2007005280-A2 MOLDING COMPOSITION AND METHOD, AND MOLDED ARTICLE GENERAL ELECTRIC COMPANY (US) 2007-01-11 WO claimed
US-20070004819-A1 A curable epoxy resin , two latent cationic curing catalyst, a free radical-producng cocatalyst and inorganic filler of about 70-95 weight % based on the total weight; catalyst allows the use of increased filler loadingsto reduce moisture absorption and thermal expansion; encapsulating solid state device CITIBANK, N.A., AS COLLATERAL AGENT 2007-01-04 US claimed
EP-3081612-A1 PHOTOCURABLE COMPOSITION HAVING ADHESIVE PROPERTIES Cemedine Co., Ltd. (JP) 2016-10-19 EP disclosed
US-9073296-B2 Laminate structure comprising a protective layer and an exposed photopolymer layer BAYER INTELLECTUAL PROPERTY GMBH (DE) 2015-07-07 US disclosed
US-8852829-B2 Prepolymer-based polyurethane formulations for producing holographic media BAYER MATERIALSCIENCE AG (DE) 2014-10-07 US disclosed
US-20130177746-A1 LAMINATE STRUCTURE COMPRISING A PROTECTIVE LAYER AND AN EXPOSED PHOTOPOLYMER LAYER BAYER INTELLECTUAL PROPERTY GMBH (DE) 2013-07-11 US disclosed
US-20120321998-A1 PHOTOPOLYMER FORMULATION HAVING TRIAZINE-BASED WRITING MONOMERS BAYER INTELLECTUAL PROPERTY GMBH (DE) 2012-12-20 US disclosed
US-20110189591-A1 PREPOLYMER-BASED POLYURETHANE FORMULATIONS FOR PRODUCING HOLOGRAPHIC MEDIA COVESTRO DEUTSCHLAND AG (DE) 2011-08-04 US disclosed
US-20020155372-A1 Imaging media containing heat developable photosensitive microcapsules SIPIX IMAGING, INC. 2002-10-24 US disclosed
WO-2001092024-A2 IMAGING MEDIA CONTAINING HEAT DEVELOPABLE PHOTOSENSITIVE MICROCAPSULES SIPIX IMAGING, INC. (US) 2001-12-06 WO disclosed
EP-1112288-A1 THERMAL- AND PHOTOINITIATED RADICAL POLYMERIZATION IN THE PRESENCE OF AN ADDITION FRAGMENTATION AGENT Ciba SC Holding AG (CH) 2001-07-04 EP disclosed
EP-1032576-A1 PHOTOACTIVATABLE NITROGEN-CONTAINING BASES BASED ON $g(a)-AMMONIUM KETONES, IMINIUM KETONES OR AMIDINIUM KETONES AND ARYL BORATES Ciba SC Holding AG (CH) 2000-09-06 EP disclosed
WO-2000011041-A1 THERMAL- AND PHOTOINITIATED RADICAL POLYMERIZATION IN THE PRESENCE OF AN ADDITION FRAGMENTATION AGENT CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2000-03-02 WO disclosed
WO-1998038195-A1 PHOTOACTIVATABLE NITROGEN-CONTAINING BASES BASED ON α-AMMONIUM KETONES, IMINIUM KETONES OR AMIDINIUM KETONES AND ARYL BORATES CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 1998-09-03 WO disclosed