Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DNM1 | Q05193 | 2/20 | 0.40 |
| ▸ | MEN1 | O00255 | 2/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
| ▸ | TP53 | P04637 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.39 |
| ▸ | PKM | P14618 | 1/20 | 0.39 |
| ▸ | CES2 | O00748 | 1/20 | 0.39 |
| ▸ | CES1 | P23141 | 1/20 | 0.39 |
| ▸ | HTT | P42858 | 2/20 | 0.38 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.38 |
| ▸ | NAAA | Q02083 | 1/20 | 0.38 |
| ▸ | LIPG | Q9Y5X9 | 1/20 | 0.37 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.37 |
| ▸ | LTA4H | P09960 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3863463 | 1.00 | DNM1 (0.40) | DNM1MEN1KMT2ATP53MAPK1 | |
| SCHEMBL308412 | 1.00 | DNM1 (0.40) | DNM1MEN1KMT2ATP53MAPK1 | |
| SCHEMBL308300 | 1.00 | DNM1 (0.40) | DNM1MEN1KMT2ATP53MAPK1 | |
| SCHEMBL21810697 | 0.98 | DNM1 (0.39) | DNM1MEN1KMT2ATP53MAPK1 | |
| SCHEMBL21810704 | 0.98 | DNM1 (0.39) | DNM1MEN1KMT2ATP53MAPK1 | |
| SCHEMBL21810713 | 0.98 | DNM1 (0.39) | DNM1MEN1KMT2ATP53MAPK1 | |
| SCHEMBL4532567 | 0.98 | LTA4H (0.38) | DNM1MEN1KMT2ATP53MAPK1 | |
| Tetramethylammonium Ion SCHEMBL8574603 | 0.94 | DNM1 (0.44) | DNM1MEN1KMT2ATP53MAPK1 | |
| Tetramethylammonium Ion SCHEMBL3615088 | 0.94 | DNM1 (0.44) | DNM1MEN1KMT2ATP53MAPK1 | |
| SCHEMBL8568117 | 0.94 | DNM1 (0.37) | DNM1MEN1KMT2ATP53MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4043502-B1 | PHOTOPOLYMERIZABLE HOE COMPOSITION | XETOS AG (DE) | 2023-10-04 | — | — | EP | claimed |
| EP-4043961-B1 | 2K SYSTEM | XETOS AG (DE) | 2023-08-16 | — | — | EP | claimed |
| EP-4043963-B1 | IMPROVED BLEACHING | XETOS AG (DE) | 2023-07-05 | — | — | EP | claimed |
| EP-2218745-B1 | Prepolymer-based polyurethane formulations for producing holographic films | BAYER MATERIALSCIENCE AG (DE) | 2011-11-23 | — | — | EP | claimed |
| EP-4010441-B1 | LOW DIELECTRIC CONSTANT SILICEOUS FILM MANUFACTURING COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME | MERCK PATENT GMBH (DE) | 2023-09-06 | — | — | EP | disclosed |
| US-11512171-B2 | Low dielectric constant siliceous film manufacturing composition and methods for producing cured film and electronic device using the same | MERCK PATENT GMBH (DE) | 2022-11-29 | — | — | US | disclosed |
| US-20220267532-A1 | LOW DIELECTRIC CONSTANT SILICEOUS FILM MANUFACTURING COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME | MERCK PATENT GMBH (DE) | 2022-08-25 | — | — | US | disclosed |
| EP-4010441-A1 | LOW DIELECTRIC CONSTANT SILICEOUS FILM MANUFACTURING COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME | Merck Patent GmbH (DE) | 2022-06-15 | — | — | EP | disclosed |
| CN-114207043-A | Composition for producing low dielectric constant siliceous film and method for producing cured film and electronic device using the same | 默克专利有限公司 | 2022-03-18 | — | — | CN | disclosed |
| WO-2021028297-A1 | LOW DIELECTRIC CONSTANT SILICEOUS FILM MANUFACTURING COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME | MERCK PATENT GMBH (DE) | 2021-02-18 | — | — | WO | disclosed |
| CN-111373326-A | Composition for forming film for lithography, method for forming resist pattern, and method for forming circuit pattern | 三菱瓦斯化学株式会社 | 2020-07-03 | — | — | CN | disclosed |
| WO-2019113602-A1 | HIGHLY EFFICIENT FREE RADICAL PHOTOPOLYMERIZATIONS THROUGH ENABLED DARK CURE | THE REGENTS OF THE UNIVERSITY OF COLORADO (US) | 2019-06-13 | — | — | WO | disclosed |
| WO-2000011041-A1 | THERMAL- AND PHOTOINITIATED RADICAL POLYMERIZATION IN THE PRESENCE OF AN ADDITION FRAGMENTATION AGENT | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2000-03-02 | — | — | WO | disclosed |
| WO-1998038195-A1 | PHOTOACTIVATABLE NITROGEN-CONTAINING BASES BASED ON α-AMMONIUM KETONES, IMINIUM KETONES OR AMIDINIUM KETONES AND ARYL BORATES | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 1998-09-03 | — | — | WO | disclosed |
| US-5496696-A | PHOTOSENSITIVE MEDIUM WITH ORGANOBORATE SALT | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1996-03-05 | — | — | US | disclosed |
| EP-0353030-B1 | Photopolymerization initiator and photosensitive composition employing the same | CANON KK (JP) | 1995-03-15 | — | — | EP | disclosed |
| EP-0587338-A2 | Silver halide imaging materials | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1994-03-16 | — | — | EP | disclosed |
| US-5260180-A | Photothermographic imaging media employing silver salts of tetrahydrocarbyl borate anions | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1993-11-09 | — | — | US | disclosed |
| US-5124235-A | Photopolymerization initiator and photosensitive composition employing the same | CANON KABUSHIKI KAISHA (JP) | 1992-06-23 | — | — | US | disclosed |
| EP-0353030-A2 | Photopolymerization initiator and photosensitive composition employing the same | CANON KABUSHIKI KAISHA (JP) | 1990-01-31 | — | — | EP | disclosed |