Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CTSK | P43235 | 9/20 | 0.38 |
| ▸ | CTSL | P07711 | 1/20 | 0.38 |
| ▸ | CTSB | P07858 | 1/20 | 0.38 |
| ▸ | CTSH | P09668 | 1/20 | 0.38 |
| ▸ | CTSS | P25774 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 4/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.37 |
| ▸ | POLB | P06746 | 1/20 | 0.37 |
| ▸ | ATM | Q13315 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | PCSK9 | Q8NBP7 | 1/20 | 0.35 |
| ▸ | MME | P08473 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8016478 | 0.96 | MEN1 (0.38) | CTSKCTSLCTSBCTSHCTSS | |
| SCHEMBL8023308 | 0.94 | MEN1 (0.39) | MEN1KMT2AATMALDH1A1 | |
| Tetrabuthylammonium SCHEMBL19096924 | 0.92 | CTSK (0.36) | CTSKCTSLCTSBCTSHCTSS | |
| SCHEMBL7666676 | 0.88 | CTSK (0.37) | CTSKCTSLCTSBCTSHCTSS | |
| SCHEMBL532851 | 0.85 | LMNA (0.39) | MEN1KMT2APOLBALDH1A1 | |
| SCHEMBL25409960 | 0.84 | LMNA (0.39) | MEN1KMT2AATMALDH1A1 | |
| SCHEMBL8016468 | 0.84 | MEN1 (0.37) | CTSKCTSLCTSBCTSHCTSS | |
| SCHEMBL29031301 | 0.84 | KCNH2 (0.36) | MEN1KMT2AATM | |
| SCHEMBL3623440 | 0.84 | LMNA (0.38) | MEN1KMT2APOLB | |
| Ammonia Solution, Strong SCHEMBL8366918 | 0.84 | LMNA (0.38) | MEN1KMT2APOLBALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4043502-B1 | PHOTOPOLYMERIZABLE HOE COMPOSITION | XETOS AG (DE) | 2023-10-04 | — | — | EP | claimed |
| EP-4043961-B1 | 2K SYSTEM | XETOS AG (DE) | 2023-08-16 | — | — | EP | claimed |
| EP-4043963-B1 | IMPROVED BLEACHING | XETOS AG (DE) | 2023-07-05 | — | — | EP | claimed |
| EP-2218745-B1 | Prepolymer-based polyurethane formulations for producing holographic films | BAYER MATERIALSCIENCE AG (DE) | 2011-11-23 | — | — | EP | claimed |
| CN-114207043-B | Composition for producing siliceous film having low dielectric constant and method for producing cured film and electronic device using the same | 默克专利有限公司 | 2023-09-15 | — | — | CN | disclosed |
| EP-4010441-B1 | LOW DIELECTRIC CONSTANT SILICEOUS FILM MANUFACTURING COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME | MERCK PATENT GMBH (DE) | 2023-09-06 | — | — | EP | disclosed |
| US-11512171-B2 | Low dielectric constant siliceous film manufacturing composition and methods for producing cured film and electronic device using the same | MERCK PATENT GMBH (DE) | 2022-11-29 | — | — | US | disclosed |
| US-20220267532-A1 | LOW DIELECTRIC CONSTANT SILICEOUS FILM MANUFACTURING COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME | MERCK PATENT GMBH (DE) | 2022-08-25 | — | — | US | disclosed |
| EP-4010441-A1 | LOW DIELECTRIC CONSTANT SILICEOUS FILM MANUFACTURING COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME | Merck Patent GmbH (DE) | 2022-06-15 | — | — | EP | disclosed |
| CN-114207043-A | Composition for producing low dielectric constant siliceous film and method for producing cured film and electronic device using the same | 默克专利有限公司 | 2022-03-18 | — | — | CN | disclosed |
| CN-113166415-A | Material for forming film for lithography, composition for forming film for lithography, underlayer film for lithography, and pattern formation method | 三菱瓦斯化学株式会社 | 2021-07-23 | — | — | CN | disclosed |
| CN-113039177-A | Material for forming film for lithography, composition for forming film for lithography, underlayer film for lithography, and pattern formation method | 三菱瓦斯化学株式会社 | 2021-06-25 | — | — | CN | disclosed |
| EP-0587338-A2 | Silver halide imaging materials | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1994-03-16 | — | — | EP | disclosed |
| US-5260180-A | Photothermographic imaging media employing silver salts of tetrahydrocarbyl borate anions | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1993-11-09 | — | — | US | disclosed |
| US-5124235-A | Photopolymerization initiator and photosensitive composition employing the same | CANON KABUSHIKI KAISHA (JP) | 1992-06-23 | — | — | US | disclosed |
| EP-0453317-A2 | Image forming medium | CANON KABUSHIKI KAISHA (JP) | 1991-10-23 | — | — | EP | disclosed |
| US-4954414-A | Photosensitive composition containing a transition metal coordination complex cation and a borate anion and photosensitive materials employing the same | THE MEAD CORPORATION (US) | 1990-09-04 | — | — | US | disclosed |
| CN-1042723-A | Contain the photosensitive composition of transition metal coordination complex cation and acid anion and contain the photochromics of said composition | MEAD CORP (US) | 1990-06-06 | — | — | CN | disclosed |
| EP-0368629-A2 | Photoinitiators and photosensitive compositions containing such photoinitiators | THE MEAD CORPORATION (US) | 1990-05-16 | — | — | EP | disclosed |
| EP-0353030-A2 | Photopolymerization initiator and photosensitive composition employing the same | CANON KABUSHIKI KAISHA (JP) | 1990-01-31 | — | — | EP | disclosed |